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Delocalization of femtosecond radiation in silicon |
Optics Letters, Vol. 37, Issue 16, pp. 3369-3371 (2012)
http://dx.doi.org/10.1364/OL.37.003369
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Abstract
The processes, induced by local action of the IR femtosecond laser pulse (
© 2012 Optical Society of America
OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(190.4720) Nonlinear optics : Optical nonlinearities of condensed matter
(320.7100) Ultrafast optics : Ultrafast measurements
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors
(280.5395) Remote sensing and sensors : Plasma diagnostics
ToC Category:
Lasers and Laser Optics
History
Original Manuscript: March 26, 2012
Revised Manuscript: July 13, 2012
Manuscript Accepted: July 15, 2012
Published: August 7, 2012
Citation
Vitali V. Kononenko, Vitali V. Konov, and Evgeny M. Dianov, "Delocalization of femtosecond radiation in silicon," Opt. Lett. 37, 3369-3371 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-16-3369
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