|
Defect-tolerant extreme ultraviolet nanoscale printing |
Optics Letters, Vol. 37, Issue 17, pp. 3633-3635 (2012)
http://dx.doi.org/10.1364/OL.37.003633
Enhanced HTML 
Acrobat PDF (417 KB)
Abstract
We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations.
© 2012 Optical Society of America
OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(110.4235) Imaging systems : Nanolithography
ToC Category:
X-ray Optics
History
Original Manuscript: April 30, 2012
Revised Manuscript: July 10, 2012
Manuscript Accepted: July 11, 2012
Published: August 27, 2012
Citation
L. Urbanski, A. Isoyan, A. Stein, J. J. Rocca, C. S. Menoni, and M. C. Marconi, "Defect-tolerant extreme ultraviolet nanoscale printing," Opt. Lett. 37, 3633-3635 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-17-3633
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Demonstration of transient gain x-ray lasers near 20nm for nickellike yttrium, zirconium, niobium, and molybdenum (OL)
- Demonstration of a neonlike argon soft-x-ray laser with a picosecond-laser-irradiated gas puff target (OL)
- Demonstration of a transient-gain nickel-like xenon-ion x-ray laser (OL)
- Investigations of collisionally pumped optical field ionization soft-x-ray lasers (JOSAB)
- Picosecond-laser-driven gas puff neonlike argon x-ray laser (JOSAB)
Related Conference Papers
- Saturated 13.2 nm High Repetition Rate Laser in Nickel-like Cd and Isoelectronic Scaling Down to 10.9 nm
- Saturated 13.2 nm High Repetition Rate Laser in Nickel-like Cd and Isoelectronic Scaling Down to 10.9 nm
- Transition Radiation in Multilayer Nanostructures as a Medical Source of Hard-X-ray Radiation
- Gain Saturated Operation of Table-Top Soft X-ray Lasers in Neon-like Ions at 5 Hz Repetition Rate
- Efficient 13.5 nm EUV Generation from a Laser Plasma
« Previous Article | Next Article »
OSA is a member of 