We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations.
© 2012 Optical Society of America
Original Manuscript: April 30, 2012
Revised Manuscript: July 10, 2012
Manuscript Accepted: July 11, 2012
Published: August 27, 2012
L. Urbanski, A. Isoyan, A. Stein, J. J. Rocca, C. S. Menoni, and M. C. Marconi, "Defect-tolerant extreme ultraviolet nanoscale printing," Opt. Lett. 37, 3633-3635 (2012)