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Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures |
Optics Letters, Vol. 37, Issue 18, pp. 3816-3818 (2012)
http://dx.doi.org/10.1364/OL.37.003816
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Abstract
In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390–785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.
© 2012 Optical Society of America
OCIS Codes
(250.5230) Optoelectronics : Photoluminescence
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures
ToC Category:
Thin Films
History
Original Manuscript: May 29, 2012
Revised Manuscript: July 7, 2012
Manuscript Accepted: August 8, 2012
Published: September 7, 2012
Citation
Yiyu Ou, Valdas Jokubavicius, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou, "Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures," Opt. Lett. 37, 3816-3818 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-18-3816
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