In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390–785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.
© 2012 Optical Society of America
Original Manuscript: May 29, 2012
Revised Manuscript: July 7, 2012
Manuscript Accepted: August 8, 2012
Published: September 7, 2012
Yiyu Ou, Valdas Jokubavicius, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou, "Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures," Opt. Lett. 37, 3816-3818 (2012)