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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 37, Iss. 18 — Sep. 15, 2012
  • pp: 3816–3818

Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures

Yiyu Ou, Valdas Jokubavicius, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou  »View Author Affiliations


Optics Letters, Vol. 37, Issue 18, pp. 3816-3818 (2012)
http://dx.doi.org/10.1364/OL.37.003816


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Abstract

In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390–785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.

© 2012 Optical Society of America

OCIS Codes
(250.5230) Optoelectronics : Photoluminescence
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Thin Films

History
Original Manuscript: May 29, 2012
Revised Manuscript: July 7, 2012
Manuscript Accepted: August 8, 2012
Published: September 7, 2012

Citation
Yiyu Ou, Valdas Jokubavicius, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou, "Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures," Opt. Lett. 37, 3816-3818 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-18-3816

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