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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 37, Iss. 2 — Jan. 15, 2012
  • pp: 160–162

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk  »View Author Affiliations


Optics Letters, Vol. 37, Issue 2, pp. 160-162 (2012)
http://dx.doi.org/10.1364/OL.37.000160


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Abstract

A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100nm out-of-band radiation in EUV lithography.

© 2012 Optical Society of America

OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(230.4170) Optical devices : Multilayers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(050.6875) Diffraction and gratings : Three-dimensional fabrication
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Diffraction and Gratings

History
Original Manuscript: November 2, 2011
Revised Manuscript: November 18, 2011
Manuscript Accepted: November 18, 2011
Published: January 10, 2012

Citation
A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, "Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection," Opt. Lett. 37, 160-162 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-2-160


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References

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