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Polarization-dependent ablation of silicon using tightly focused femtosecond laser vortex pulses |
Optics Letters, Vol. 37, Issue 2, pp. 226-228 (2012)
http://dx.doi.org/10.1364/OL.37.000226
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Abstract
We demonstrate experimentally that, in a tight focusing geometry, circularly polarized femtosecond laser vortex pulses ablate material differently depending on the handedness of light. This effect offers an additional degree of freedom to control the shape and size of laser-machined structures on a subwavelength scale.
© 2012 Optical Society of America
OCIS Codes
(140.3300) Lasers and laser optics : Laser beam shaping
(140.3390) Lasers and laser optics : Laser materials processing
(140.3440) Lasers and laser optics : Laser-induced breakdown
(320.2250) Ultrafast optics : Femtosecond phenomena
(320.7160) Ultrafast optics : Ultrafast technology
ToC Category:
Ultrafast Optics
History
Original Manuscript: October 27, 2011
Revised Manuscript: November 29, 2011
Manuscript Accepted: November 29, 2011
Published: January 13, 2012
Citation
Cyril Hnatovsky, Vladlen G. Shvedov, Natalia Shostka, Andrei V. Rode, and Wieslaw Krolikowski, "Polarization-dependent ablation of silicon using tightly focused femtosecond laser vortex pulses," Opt. Lett. 37, 226-228 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-2-226
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