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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 37, Iss. 2 — Jan. 15, 2012
  • pp: 247–249

Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth

Sha Shi, Zhiyou Zhang, Jinglei Du, Zheng Yang, Ruiying Shi, Shuhong Li, and Fuhua Gao  »View Author Affiliations

Optics Letters, Vol. 37, Issue 2, pp. 247-249 (2012)

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We propose a new direct writing nanolithography approach using a plasmonic focusing device and a nano silver mirror with dual-wavelength illumination for high exposure depth. Arrays of pyramid aperture are used to focus the incident light beams into 80 nm light spots. The pyramid combined with a thin silver film coated on the substrate constructs a surface plasmon polaritons (SPP) coupling cavity, which amplifies the intensity of the light field in it by SPP effect and resonance. The transmission depth of the standing wave formed by forward and reflected light could reach hundreds of nanometers. Two lasers with different wavelengths are used as illumination sources to homogenize the light field through complementation between the two standing waves. Simulation results show by using 355 nm and 441 nm wavelengths, a space of 44 nm at the bottom of the photoresist could be obtained after exposure and development. The feature size of resist patterns could be further scaled down, depending on the optimization of parameters of photoresist exposure and development, illumination wavelengths, etc.

© 2012 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Optics at Surfaces

Original Manuscript: October 11, 2011
Revised Manuscript: November 9, 2011
Manuscript Accepted: November 21, 2011
Published: January 13, 2012

Sha Shi, Zhiyou Zhang, Jinglei Du, Zheng Yang, Ruiying Shi, Shuhong Li, and Fuhua Gao, "Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth," Opt. Lett. 37, 247-249 (2012)

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