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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 37, Iss. 20 — Oct. 15, 2012
  • pp: 4317–4319

Impact of surface roughness on the effective dielectric constants and subwavelength image resolution of metal–insulator stack lenses

Shivanand, Alon Ludwig, and Kevin J. Webb  »View Author Affiliations


Optics Letters, Vol. 37, Issue 20, pp. 4317-4319 (2012)
http://dx.doi.org/10.1364/OL.37.004317


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Abstract

The effective parallel and perpendicular dielectric constants for a multilayer metal–insulator stack are obtained from numerical simulations and compared with analytical homogenization results as a function of wavelength and number of periods. The influence of inevitable film surface roughness on the homogenized dielectric constants, determined from numerical scattered field calculations, is evaluated as a function of roughness. The impact of this roughness on resolution in a subwavelength imaging application gives smoothness guidelines for material deposition.

© 2012 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(260.2110) Physical optics : Electromagnetic optics
(310.6860) Thin films : Thin films, optical properties
(160.3918) Materials : Metamaterials
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

History
Original Manuscript: July 5, 2012
Manuscript Accepted: August 24, 2012
Published: October 12, 2012

Citation
Shivanand, Alon Ludwig, and Kevin J. Webb, "Impact of surface roughness on the effective dielectric constants and subwavelength image resolution of metal–insulator stack lenses," Opt. Lett. 37, 4317-4319 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-20-4317


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