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Optics Letters

Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 37, Iss. 24 — Dec. 15, 2012
  • pp: 5100–5102

Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength

Johannes Overbuschmann, Julia Hengster, Stephan Irsen, and Thomas Wilhein  »View Author Affiliations


Optics Letters, Vol. 37, Issue 24, pp. 5100-5102 (2012)
http://dx.doi.org/10.1364/OL.37.005100


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Abstract

Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (<150nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at λ=13nm wavelength.

© 2012 Optical Society of America

OCIS Codes
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(050.1965) Diffraction and gratings : Diffractive lenses

ToC Category:
X-ray Optics

History
Original Manuscript: August 6, 2012
Revised Manuscript: November 5, 2012
Manuscript Accepted: November 9, 2012
Published: December 7, 2012

Virtual Issues
Vol. 8, Iss. 1 Virtual Journal for Biomedical Optics

Citation
Johannes Overbuschmann, Julia Hengster, Stephan Irsen, and Thomas Wilhein, "Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength," Opt. Lett. 37, 5100-5102 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-24-5100

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