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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 37, Iss. 4 — Feb. 15, 2012
  • pp: 563–565

Sub-100 nm structuring of indium-tin-oxide thin films by sub-15 femtosecond pulsed near-infrared laser light

Maziar Afshar, Martin Straub, Henning Voellm, Dara Feili, Karsten Koenig, and Helmut Seidel  »View Author Affiliations

Optics Letters, Vol. 37, Issue 4, pp. 563-565 (2012)

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In magnetron sputtered indium-tin-oxide thin films of varying oxygen content, nanostructures were formed using tightly focused high-repetition rate near-infrared sub-15 femtosecond pulsed laser light. At radiant exposure well beyond the ablation threshold, cuts of 280–350 nm in width were generated. Illumination close to the ablation threshold resulted in periodic cuts of typically 20 nm in width at periodicities between 50 nm and 180 nm, as well as single sub-20 nm cuts. Subthreshold exposure, in combination with hydrochloric acid etching, yielded nanowires of 50 nm minimum lateral dimensions.

© 2012 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(140.7090) Lasers and laser optics : Ultrafast lasers
(190.4180) Nonlinear optics : Multiphoton processes
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors
(310.6628) Thin films : Subwavelength structures, nanostructures
(310.7005) Thin films : Transparent conductive coatings

ToC Category:
Lasers and Laser Optics

Original Manuscript: November 22, 2011
Manuscript Accepted: December 9, 2011
Published: February 8, 2012

Maziar Afshar, Martin Straub, Henning Voellm, Dara Feili, Karsten Koenig, and Helmut Seidel, "Sub-100 nm structuring of indium-tin-oxide thin films by sub-15 femtosecond pulsed near-infrared laser light," Opt. Lett. 37, 563-565 (2012)

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