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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 37, Iss. 5 — Mar. 1, 2012
  • pp: 779–781

Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers

Yuichiro Ezoe, Teppei Moriyama, Tomohiro Ogawa, Takuya Kakiuchi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Tatsuhiko Aoki, Kohei Morishita, and Kazuo Nakajima  »View Author Affiliations


Optics Letters, Vol. 37, Issue 5, pp. 779-781 (2012)
http://dx.doi.org/10.1364/OL.37.000779


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Abstract

Large-aperture focusing of Al Kα 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.

© 2012 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(340.7440) X-ray optics : X-ray imaging
(340.7470) X-ray optics : X-ray mirrors
(350.1260) Other areas of optics : Astronomical optics

ToC Category:
X-ray Optics

History
Original Manuscript: November 22, 2011
Revised Manuscript: December 28, 2011
Manuscript Accepted: January 14, 2012
Published: February 17, 2012

Citation
Yuichiro Ezoe, Teppei Moriyama, Tomohiro Ogawa, Takuya Kakiuchi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Tatsuhiko Aoki, Kohei Morishita, and Kazuo Nakajima, "Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers," Opt. Lett. 37, 779-781 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-5-779


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References

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