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Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers |
Optics Letters, Vol. 37, Issue 5, pp. 779-781 (2012)
http://dx.doi.org/10.1364/OL.37.000779
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Abstract
Large-aperture focusing of Al
© 2012 Optical Society of America
OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(340.7440) X-ray optics : X-ray imaging
(340.7470) X-ray optics : X-ray mirrors
(350.1260) Other areas of optics : Astronomical optics
ToC Category:
X-ray Optics
History
Original Manuscript: November 22, 2011
Revised Manuscript: December 28, 2011
Manuscript Accepted: January 14, 2012
Published: February 17, 2012
Citation
Yuichiro Ezoe, Teppei Moriyama, Tomohiro Ogawa, Takuya Kakiuchi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Tatsuhiko Aoki, Kohei Morishita, and Kazuo Nakajima, "Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers," Opt. Lett. 37, 779-781 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-5-779
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