We propose a general method called convolution-variation separation (CVS) to enable efficient optical imaging calculations without sacrificing accuracy when simulating images for a wide range of process variations. The CVS method is derived from first principles using a series expansion, which consists of a set of predetermined basis functions weighted by a set of predetermined expansion coefficients. The basis functions are independent of the process variations and thus may be computed and stored in advance, while the expansion coefficients depend only on the process variations. Optical image simulations for defocus and aberration variations with applications in robust inverse lithography technology and lens aberration metrology have demonstrated the main concept of the CVS method.
© 2013 Optical Society of America
Original Manuscript: March 18, 2013
Revised Manuscript: April 22, 2013
Manuscript Accepted: May 5, 2013
Published: June 18, 2013
Shiyuan Liu, Xinjiang Zhou, Wen Lv, Shuang Xu, and Haiqing Wei, "Convolution-variation separation method for efficient modeling of optical lithography," Opt. Lett. 38, 2168-2170 (2013)