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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 38, Iss. 13 — Jul. 1, 2013
  • pp: 2212–2214

Fabrication of polarization-dependent light attenuator in fused silica using a low-repetition-rate femtosecond laser

Fangteng Zhang, Yongze Yu, Chen Cheng, Ye Dai, and Jianrong Qiu  »View Author Affiliations


Optics Letters, Vol. 38, Issue 13, pp. 2212-2214 (2013)
http://dx.doi.org/10.1364/OL.38.002212


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Abstract

In this Letter, we have demonstrated the direct writing of polarization-dependent light attenuator inside fused silica by tailoring 1 kHz femtosecond (fs) laser induced self-organized nanogratings. Optical birefringence was observed to vary with the polarization plane azimuth of the fs laser and scanning direction. The formation of self-organized nanogratings was confirmed by scanning electron microscopy observation. A polarization-dependent light attenuator was fabricated by forming a plane consisting of nanograting lines inside fused silica by scanning the fs laser. The attenuation efficiency was improved by forming a multilayer nanograting structure. The technique may find important applications in micro-optical devices.

© 2013 Optical Society of America

OCIS Codes
(160.6030) Materials : Silica
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.3990) Optical devices : Micro-optical devices
(320.2250) Ultrafast optics : Femtosecond phenomena
(350.3390) Other areas of optics : Laser materials processing

ToC Category:
Integrated Optics

History
Original Manuscript: March 7, 2013
Revised Manuscript: May 27, 2013
Manuscript Accepted: May 29, 2013
Published: June 20, 2013

Citation
Fangteng Zhang, Yongze Yu, Chen Cheng, Ye Dai, and Jianrong Qiu, "Fabrication of polarization-dependent light attenuator in fused silica using a low-repetition-rate femtosecond laser," Opt. Lett. 38, 2212-2214 (2013)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-38-13-2212


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