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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 38, Iss. 15 — Aug. 1, 2013
  • pp: 2861–2864

Photorefractive damage resistance threshold in stoichiometric LiNbO3:Zr crystals

László Kovács, Zsuzsanna Szaller, Krisztián Lengyel, Ágnes Péter, Ivett Hajdara, Gábor Mandula, László Pálfalvi, and János Hebling  »View Author Affiliations


Optics Letters, Vol. 38, Issue 15, pp. 2861-2864 (2013)
http://dx.doi.org/10.1364/OL.38.002861


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Abstract

Several optical methods including ultraviolet absorption, infrared absorption of the hydroxyl ions, Raman spectroscopy, and the Z-scan method have been used to determine the damage resistance threshold in 0–0.72 mol. % Zr-containing, flux-grown, nearly stoichiometric LiNbO3 single crystals. All spectroscopical methods used indicate that samples containing at least 0.085mol.% Zr in the crystal are above the threshold while Z-scan data locate the photorefractive damage threshold between 0.085 and 0.314 mol. % Zr.

© 2013 Optical Society of America

OCIS Codes
(160.5320) Materials : Photorefractive materials
(190.4400) Nonlinear optics : Nonlinear optics, materials
(300.6340) Spectroscopy : Spectroscopy, infrared
(300.6450) Spectroscopy : Spectroscopy, Raman
(300.6540) Spectroscopy : Spectroscopy, ultraviolet

ToC Category:
Spectroscopy

History
Original Manuscript: May 17, 2013
Revised Manuscript: June 26, 2013
Manuscript Accepted: June 30, 2013
Published: July 30, 2013

Citation
László Kovács, Zsuzsanna Szaller, Krisztián Lengyel, Ágnes Péter, Ivett Hajdara, Gábor Mandula, László Pálfalvi, and János Hebling, "Photorefractive damage resistance threshold in stoichiometric LiNbO3:Zr crystals," Opt. Lett. 38, 2861-2864 (2013)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-38-15-2861


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