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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 38, Iss. 16 — Aug. 15, 2013
  • pp: 3024–3027

Modeling absorbance-modulation optical lithography in photochromic films

Giorgio Pariani, Rossella Castagna, Rajesh Menon, Chiara Bertarelli, and Andrea Bianco  »View Author Affiliations

Optics Letters, Vol. 38, Issue 16, pp. 3024-3027 (2013)

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A kinetic model describing the conversion of a photochromic layer under complex illumination conditions is applied to absorbance-modulation optical lithography to determine the influence of the material characteristics on the confinement to subdiffraction dimensions of the transmitted dose. We show that the most important parameters are the intensity ratio between the confining and writing beams, the overall absorption at the writing wavelength, the relative absorption coefficients, and the photoreaction quantum yields at the two wavelengths. As the confining beam ultimately determines the transferred dose pattern, we conclude that the modulation of the writing beam is not strictly necessary to produce subwavelength apertures.

© 2013 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(350.2450) Other areas of optics : Filters, absorption
(110.4235) Imaging systems : Nanolithography
(160.5335) Materials : Photosensitive materials

ToC Category:
Imaging Systems

Original Manuscript: May 24, 2013
Revised Manuscript: July 16, 2013
Manuscript Accepted: July 16, 2013
Published: August 7, 2013

Giorgio Pariani, Rossella Castagna, Rajesh Menon, Chiara Bertarelli, and Andrea Bianco, "Modeling absorbance-modulation optical lithography in photochromic films," Opt. Lett. 38, 3024-3027 (2013)

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