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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 38, Iss. 19 — Oct. 1, 2013
  • pp: 3862–3865

Ultraweak background scattered light reveals structure of a diffractive element

Manabu Hakko, Tomohiro Kiire, Daisuke Barada, Toyohiko Yatagai, and Yoshio Hayasaki  »View Author Affiliations

Optics Letters, Vol. 38, Issue 19, pp. 3862-3865 (2013)

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Background scattered light should normally be reduced in industrial fabrication processes; however, we demonstrated that background scattered light from an optical element contains significant structural information about the element. This was revealed by quite good agreement between the measured scattering intensity distribution of a sample and a computer simulation of the light intensity from the sample. The intensity distribution from a carefully fabricated sample with artificially controlled defects was obtained with a measurement system designed to measure ultraweak background scattered light covering an intensity range of over 1010.

© 2013 Optical Society of America

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(290.0290) Scattering : Scattering
(290.5820) Scattering : Scattering measurements

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: July 18, 2013
Revised Manuscript: August 25, 2013
Manuscript Accepted: August 30, 2013
Published: September 24, 2013

Manabu Hakko, Tomohiro Kiire, Daisuke Barada, Toyohiko Yatagai, and Yoshio Hayasaki, "Ultraweak background scattered light reveals structure of a diffractive element," Opt. Lett. 38, 3862-3865 (2013)

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