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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 38, Iss. 20 — Oct. 15, 2013
  • pp: 4252–4255

Dip-in depletion optical lithography of three-dimensional chiral polarizers

Michael Thiel, Julian Ott, André Radke, Johannes Kaschke, and Martin Wegener  »View Author Affiliations

Optics Letters, Vol. 38, Issue 20, pp. 4252-4255 (2013)

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We combine the concepts of dip-in and stimulated-emission-depletion-inspired optical lithography for the first time to fabricate three-dimensional (3D) nanostructures for photonics. For depletion of the photoinitiator ITX we employ a fiber-coupled laser diode at 639 nm wavelength. To demonstrate the performance of the experimental setup, we have fabricated 3D chiral layer-by-layer twisted woodpile structures with a lattice constant reduced by more than a factor of 2 compared to earlier results. The fabricated chiral photonic crystals serve as dual-band polarizers for circular polarization at visible and telecom wavelengths. Spectroscopic measurements agree well with scattering-matrix calculations.

© 2013 Optical Society of America

OCIS Codes
(100.6640) Image processing : Superresolution
(160.5293) Materials : Photonic bandgap materials
(160.5298) Materials : Photonic crystals
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Diffraction and Gratings

Original Manuscript: July 22, 2013
Manuscript Accepted: September 11, 2013
Published: October 15, 2013

Michael Thiel, Julian Ott, André Radke, Johannes Kaschke, and Martin Wegener, "Dip-in depletion optical lithography of three-dimensional chiral polarizers," Opt. Lett. 38, 4252-4255 (2013)

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