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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 38, Iss. 21 — Nov. 1, 2013
  • pp: 4308–4311

Damage threshold influenced by the high absorption defect at the film–substrate interface under ultraviolet laser irradiation

Zhenkun Yu, Hongbo He, Wei Sun, Hongji Qi, Minghong Yang, Qiling Xiao, and Meiping Zhu  »View Author Affiliations


Optics Letters, Vol. 38, Issue 21, pp. 4308-4311 (2013)
http://dx.doi.org/10.1364/OL.38.004308


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Abstract

The laser-induced damage threshold (LIDT) of a single-layer coating at the nanosecond (ns) regime is obviously lower than an uncoated substrate or a high reflectivity coating coated by the same material. To elucidate this phenomenon, we demonstrate the LIDT of three types of samples at 355 nm with 8 ns. High absorption defects are found at the film–substrate interface by comparing their LIDTs and damage morphologies. These defects originate from the substrate and appear during the coating process. Simulation results show that these defects, coupled to the coating, are mainly responsible for decreasing the damage threshold.

© 2013 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(160.2220) Materials : Defect-center materials
(310.6870) Thin films : Thin films, other properties

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: July 16, 2013
Revised Manuscript: September 2, 2013
Manuscript Accepted: September 17, 2013
Published: October 18, 2013

Citation
Zhenkun Yu, Hongbo He, Wei Sun, Hongji Qi, Minghong Yang, Qiling Xiao, and Meiping Zhu, "Damage threshold influenced by the high absorption defect at the film–substrate interface under ultraviolet laser irradiation," Opt. Lett. 38, 4308-4311 (2013)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-38-21-4308

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