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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 38, Iss. 22 — Nov. 15, 2013
  • pp: 4907–4910

Fast mapping of absorbing defects in optical materials by full-field photothermal reflectance microscopy

Woo June Choi, Seon Young Ryu, Jun Ki Kim, Jae Young Kim, Dong Uk Kim, and Ki Soo Chang  »View Author Affiliations


Optics Letters, Vol. 38, Issue 22, pp. 4907-4910 (2013)
http://dx.doi.org/10.1364/OL.38.004907


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Abstract

We report a technique for rapidly mapping absorbing defects in optical materials, which act as laser-induced damage precursors, based on full-field photothermal reflectance microscopy. An intensity-modulated pump beam heats absorbing defects in the optical sample, creating localized, modulated refractive-index variations around the defects. A probe beam then illuminates the defect sites, and the measured amplitude of the reflectance variation is used to map the distribution of defects in the medium. Measurements show that this method offers a faster defect mapping speed of about 0.03mm2 per minute and a detectivity of a few tens of nanometers comparable to that of conventional scanning photothermal deflection microscopy.

© 2013 Optical Society of America

OCIS Codes
(110.0180) Imaging systems : Microscopy
(140.3330) Lasers and laser optics : Laser damage
(350.5340) Other areas of optics : Photothermal effects

ToC Category:
Imaging Systems

History
Original Manuscript: September 3, 2013
Revised Manuscript: October 21, 2013
Manuscript Accepted: October 23, 2013
Published: November 15, 2013

Citation
Woo June Choi, Seon Young Ryu, Jun Ki Kim, Jae Young Kim, Dong Uk Kim, and Ki Soo Chang, "Fast mapping of absorbing defects in optical materials by full-field photothermal reflectance microscopy," Opt. Lett. 38, 4907-4910 (2013)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-38-22-4907


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