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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 38, Iss. 23 — Dec. 1, 2013
  • pp: 5067–5070

Terahertz wire grid polarizer fabricated by imprinting porous silicon

Kenji Imakita, Takeshi Kamada, Minoru Fujii, Kanna Aoki, Minoru Mizuhata, and Shinji Hayashi  »View Author Affiliations

Optics Letters, Vol. 38, Issue 23, pp. 5067-5070 (2013)

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A terahertz (THz) wire-grid polarizer is fabricated by imprinting porous Si followed by oblique evaporation of Ag. We demonstrate that it works in a wide frequency region covering from 5 to 18 THz with the extinction ratio of 10 dB. The frequency region is much wider than that of THz wire-grid polarizers fabricated by conventional imprint lithography using organic materials. The result suggests that imprinting of porous Si is a promising fabrication technique to realize low-cost wire-grid polarizers working in the THz region.

© 2013 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(230.5440) Optical devices : Polarization-selective devices

ToC Category:
Optical Devices

Original Manuscript: September 9, 2013
Revised Manuscript: October 28, 2013
Manuscript Accepted: October 28, 2013
Published: November 25, 2013

Kenji Imakita, Takeshi Kamada, Minoru Fujii, Kanna Aoki, Minoru Mizuhata, and Shinji Hayashi, "Terahertz wire grid polarizer fabricated by imprinting porous silicon," Opt. Lett. 38, 5067-5070 (2013)

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