A terahertz (THz) wire-grid polarizer is fabricated by imprinting porous Si followed by oblique evaporation of Ag. We demonstrate that it works in a wide frequency region covering from 5 to 18 THz with the extinction ratio of 10 dB. The frequency region is much wider than that of THz wire-grid polarizers fabricated by conventional imprint lithography using organic materials. The result suggests that imprinting of porous Si is a promising fabrication technique to realize low-cost wire-grid polarizers working in the THz region.
© 2013 Optical Society of America
Original Manuscript: September 9, 2013
Revised Manuscript: October 28, 2013
Manuscript Accepted: October 28, 2013
Published: November 25, 2013
Kenji Imakita, Takeshi Kamada, Minoru Fujii, Kanna Aoki, Minoru Mizuhata, and Shinji Hayashi, "Terahertz wire grid polarizer fabricated by imprinting porous silicon," Opt. Lett. 38, 5067-5070 (2013)