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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 38, Iss. 24 — Dec. 15, 2013
  • pp: 5446–5449

Multiwavelength shearing interferometry for measuring the slopes, curvatures, and shapes of thin films/substrate systems

Changxing Zhang, Xuelin Dong, Xue Feng, and Keh-Chih Hwang  »View Author Affiliations


Optics Letters, Vol. 38, Issue 24, pp. 5446-5449 (2013)
http://dx.doi.org/10.1364/OL.38.005446


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Abstract

Multiwavelength shearing interferometry, a full-field, real-time, and vibration-insensitive method with enhanced accuracy, is proposed. Theoretically, the more wavelengths that are used for shearing interferometers, the higher the precision that can be achieved in the measurement of slopes, curvatures, and the shapes of reflective surfaces. A spherical mirror with specified curvature radius is used to calibrate this method, and then the nonuniform deformation and shape of the TiNi film/Si substrate system are obtained experimentally.

© 2013 Optical Society of America

OCIS Codes
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(140.3490) Lasers and laser optics : Lasers, distributed-feedback
(230.1950) Optical devices : Diffraction gratings

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: October 15, 2013
Manuscript Accepted: October 28, 2013
Published: December 13, 2013

Citation
Changxing Zhang, Xuelin Dong, Xue Feng, and Keh-Chih Hwang, "Multiwavelength shearing interferometry for measuring the slopes, curvatures, and shapes of thin films/substrate systems," Opt. Lett. 38, 5446-5449 (2013)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-38-24-5446

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