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Optics Letters

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  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 12 — Jun. 15, 2014
  • pp: 3421–3424

Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325  nm and its spatial resolution limit

D. Sáez-Rodríguez, K. Nielsen, O. Bang, and D. J. Webb  »View Author Affiliations


Optics Letters, Vol. 39, Issue 12, pp. 3421-3424 (2014)
http://dx.doi.org/10.1364/OL.39.003421


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Abstract

In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples.

© 2014 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(060.2310) Fiber optics and optical communications : Fiber optics
(060.3738) Fiber optics and optical communications : Fiber Bragg gratings, photosensitivity
(060.4005) Fiber optics and optical communications : Microstructured fibers
(060.5295) Fiber optics and optical communications : Photonic crystal fibers
(050.5298) Diffraction and gratings : Photonic crystals

ToC Category:
Diffraction and Gratings

History
Original Manuscript: March 17, 2014
Revised Manuscript: April 14, 2014
Manuscript Accepted: April 28, 2014
Published: June 4, 2014

Citation
D. Sáez-Rodríguez, K. Nielsen, O. Bang, and D. J. Webb, "Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325  nm and its spatial resolution limit," Opt. Lett. 39, 3421-3424 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-12-3421


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