OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 12 — Jun. 15, 2014
  • pp: 3421–3424

Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325  nm and its spatial resolution limit

D. Sáez-Rodríguez, K. Nielsen, O. Bang, and D. J. Webb  »View Author Affiliations


Optics Letters, Vol. 39, Issue 12, pp. 3421-3424 (2014)
http://dx.doi.org/10.1364/OL.39.003421


View Full Text Article

Enhanced HTML    Acrobat PDF (648 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples.

© 2014 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(060.2310) Fiber optics and optical communications : Fiber optics
(060.3738) Fiber optics and optical communications : Fiber Bragg gratings, photosensitivity
(060.4005) Fiber optics and optical communications : Microstructured fibers
(060.5295) Fiber optics and optical communications : Photonic crystal fibers
(050.5298) Diffraction and gratings : Photonic crystals

ToC Category:
Diffraction and Gratings

History
Original Manuscript: March 17, 2014
Revised Manuscript: April 14, 2014
Manuscript Accepted: April 28, 2014
Published: June 4, 2014

Citation
D. Sáez-Rodríguez, K. Nielsen, O. Bang, and D. J. Webb, "Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325  nm and its spatial resolution limit," Opt. Lett. 39, 3421-3424 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-12-3421

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited