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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 13 — Jul. 1, 2014
  • pp: 3702–3705

Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300  mm SOI wafer

Seok-Hwan Jeong, Daisuke Shimura, Takasi Simoyama, Tsuyoshi Horikawa, Yu Tanaka, and Ken Morito  »View Author Affiliations


Optics Letters, Vol. 39, Issue 13, pp. 3702-3705 (2014)
http://dx.doi.org/10.1364/OL.39.003702


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Abstract

We report good phase controllability and high production yield in Si-nanowire-based multistage delayed Mach–Zehnder interferometer-type optical multiplexers/demultiplexers (MUX/DeMUX) fabricated by an ArF-immersion lithography process on a 300 mm silicon-on-insulator (SOI) wafer. Three kinds of devices fabricated in this work exhibit clear 1×4Ch wavelength filtering operations for various optical frequency spacing. These results are promising for their applications in high-density wavelength division multiplexing-based optical interconnects.

© 2014 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7370) Optical devices : Waveguides
(130.7408) Integrated optics : Wavelength filtering devices

ToC Category:
Optical Devices

History
Original Manuscript: February 27, 2014
Revised Manuscript: May 13, 2014
Manuscript Accepted: May 15, 2014
Published: June 16, 2014

Citation
Seok-Hwan Jeong, Daisuke Shimura, Takasi Simoyama, Tsuyoshi Horikawa, Yu Tanaka, and Ken Morito, "Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300  mm SOI wafer," Opt. Lett. 39, 3702-3705 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-13-3702


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