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Optics Letters

Optics Letters


  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 13 — Jul. 1, 2014
  • pp: 3798–3801

Performance simulation of 2D photonic-crystal devices fabricated by pattern-integrated interference lithography

Matthieu C. R. Leibovici and Thomas K. Gaylord  »View Author Affiliations

Optics Letters, Vol. 39, Issue 13, pp. 3798-3801 (2014)

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Pattern-integrated interference lithography (PIIL) has recently been proposed as a rapid, single-step, and wafer-scale fabrication technique for custom-modified one-, two- and three-dimensional periodic structures. Among these structures, photonic-crystal devices have significant potential applications. In this work, we simulate the fabrication of two-dimensional photonic-crystal devices by PIIL using a rigorous vector modeling and realistic photolithographic conditions. We also model the etched patterns in silicon and evaluate the photonic-crystal motif-area and motif-displacement errors. We further calculate the device intensity transmission spectra and show that the performance of PIIL-produced devices are comparable to, and in some cases are superior to, that of their idealized equivalents.

© 2014 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.3160) Physical optics : Interference
(140.3945) Lasers and laser optics : Microcavities
(230.5298) Optical devices : Photonic crystals
(160.5335) Materials : Photosensitive materials

ToC Category:
Optical Devices

Original Manuscript: April 10, 2014
Manuscript Accepted: May 17, 2014
Published: June 19, 2014

Matthieu C. R. Leibovici and Thomas K. Gaylord, "Performance simulation of 2D photonic-crystal devices fabricated by pattern-integrated interference lithography," Opt. Lett. 39, 3798-3801 (2014)

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