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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 16 — Aug. 15, 2014
  • pp: 4747–4750

Electron beam position monitor for a dielectric microaccelerator

Ken Soong, Edgar A. Peralta, R. Joel England, Ziran Wu, Eric R. Colby, Igor Makasyuk, James P. MacArthur, Andrew Ceballos, and Robert L. Byer  »View Author Affiliations


Optics Letters, Vol. 39, Issue 16, pp. 4747-4750 (2014)
http://dx.doi.org/10.1364/OL.39.004747


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Abstract

We report the fabrication and first demonstration of an electron beam position monitor for a dielectric microaccelerator. This device is fabricated on a fused silica substrate using standard optical lithography techniques and uses the radiated optical wavelength to measure the electron beam position with a resolution of 10 μm, or 7% of the electron beam spot size. This device also measures the electron beam spot size in one dimension.

© 2014 Optical Society of America

OCIS Codes
(040.1880) Detectors : Detection
(050.2770) Diffraction and gratings : Gratings
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Detectors

History
Original Manuscript: May 23, 2014
Manuscript Accepted: June 23, 2014
Published: August 7, 2014

Citation
Ken Soong, Edgar A. Peralta, R. Joel England, Ziran Wu, Eric R. Colby, Igor Makasyuk, James P. MacArthur, Andrew Ceballos, and Robert L. Byer, "Electron beam position monitor for a dielectric microaccelerator," Opt. Lett. 39, 4747-4750 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-16-4747

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