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Optics Letters

Optics Letters


  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 2 — Jan. 15, 2014
  • pp: 402–404

Fourier spectrum method to determine dose-to-clear in a photoresist

Lei Sun, Obert Wood, Chris Clifford, Sudhar Raghunathan, Oleg Kritsun, Myungjun Lee, Ryoung-Han Kim, Pawitter Mangat, Hui Peng Koh, and Harry Levinson  »View Author Affiliations

Optics Letters, Vol. 39, Issue 2, pp. 402-404 (2014)

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A Fourier spectrum method to determine the dose-to-clear in a photoresist is proposed. The frequency content of scanning electron microscope resist images is used to determine whether the resist has been dissolved. Using this method, the dose to clear the resist is calculated automatically instead of via visual inspection, a method in which operator influence can affect the result.

© 2014 Optical Society of America

OCIS Codes
(070.4790) Fourier optics and signal processing : Spectrum analysis
(100.2960) Image processing : Image analysis
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(290.2648) Scattering : Stray light
(110.4235) Imaging systems : Nanolithography

ToC Category:
Fourier Optics and Signal Processing

Original Manuscript: August 2, 2013
Revised Manuscript: December 4, 2013
Manuscript Accepted: December 9, 2013
Published: January 15, 2014

Lei Sun, Obert Wood, Chris Clifford, Sudhar Raghunathan, Oleg Kritsun, Myungjun Lee, Ryoung-Han Kim, Pawitter Mangat, Hui Peng Koh, and Harry Levinson, "Fourier spectrum method to determine dose-to-clear in a photoresist," Opt. Lett. 39, 402-404 (2014)

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