OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 4 — Feb. 15, 2014
  • pp: 1042–1045

Pulse compression grating fabrication by diffractive proximity photolithography

Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, and Uwe D. Zeitner  »View Author Affiliations


Optics Letters, Vol. 39, Issue 4, pp. 1042-1045 (2014)
http://dx.doi.org/10.1364/OL.39.001042


View Full Text Article

Enhanced HTML    Acrobat PDF (921 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

We report about a newly devised throughput-scalable fabrication method for high-quality periodic submicron structures. The process is demonstrated for optical transmission gratings in fused silica with a period of 800 nm (1250lines/mm) to be used in laser pulse compression. The technology is based on an innovative advancement of i-line proximity photolithography performed in a mask aligner. The aerial image is encoded in a rigorously optimized electron-beam-written three-level phase mask which is illuminated by an adapted multipole configuration of incidence angles. In comparison to conventional proximity lithography, the process enables a significantly higher resolution while maintaining a good depth of focus—in contrast to lithography based on direct Talbot-imaging. Details about the grating fabrication process and characterization of fabricated pulse compression grating wafers are presented. The gratings show a diffraction efficiency of 97% at a wavelength of 1030 nm and a wavefront error comparable to gratings fabricated by electron-beam lithography.

© 2014 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(220.3740) Optical design and fabrication : Lithography
(230.4000) Optical devices : Microstructure fabrication
(320.5520) Ultrafast optics : Pulse compression
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: December 17, 2013
Revised Manuscript: January 10, 2014
Manuscript Accepted: January 12, 2014
Published: February 12, 2014

Citation
Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, and Uwe D. Zeitner, "Pulse compression grating fabrication by diffractive proximity photolithography," Opt. Lett. 39, 1042-1045 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-4-1042

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited