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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 6 — Mar. 15, 2014
  • pp: 1645–1648

Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices

Yuqing Jiao, Josselin Pello, Alonso Millan Mejia, Longfei Shen, Barry Smalbrugge, Erik Jan Geluk, Meint Smit, and Jos van der Tol  »View Author Affiliations


Optics Letters, Vol. 39, Issue 6, pp. 1645-1648 (2014)
http://dx.doi.org/10.1364/OL.39.001645


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Abstract

In this Letter, we present a method to prepare a mixed electron-beam resist composed of a positive resist (ZEP520A) and C60 fullerene. The addition of C60 to the ZEP resist changes the material properties under electron beam exposure significantly. An improvement in the thermal resistance of the mixed material has been demonstrated by fabricating multimode interference couplers and coupling regions of microring resonators. The fabrication of distributed Bragg reflector structures has shown improvement in terms of pattern definition accuracy with respect to the same structures fabricated with normal ZEP resist. Straight InP membrane waveguides with different lengths have been fabricated using this mixed resist. A decrease of the propagation loss from 6.6 to 3.3dB/cm has been demonstrated.

© 2014 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7370) Optical devices : Waveguides
(110.4235) Imaging systems : Nanolithography

ToC Category:
Optical Devices

History
Original Manuscript: January 27, 2014
Revised Manuscript: February 16, 2014
Manuscript Accepted: February 16, 2014
Published: March 13, 2014

Citation
Yuqing Jiao, Josselin Pello, Alonso Millan Mejia, Longfei Shen, Barry Smalbrugge, Erik Jan Geluk, Meint Smit, and Jos van der Tol, "Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices," Opt. Lett. 39, 1645-1648 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-6-1645

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