OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 6 — Mar. 15, 2014
  • pp: 1645–1648

Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices

Yuqing Jiao, Josselin Pello, Alonso Millan Mejia, Longfei Shen, Barry Smalbrugge, Erik Jan Geluk, Meint Smit, and Jos van der Tol  »View Author Affiliations


Optics Letters, Vol. 39, Issue 6, pp. 1645-1648 (2014)
http://dx.doi.org/10.1364/OL.39.001645


View Full Text Article

Enhanced HTML    Acrobat PDF (405 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

In this Letter, we present a method to prepare a mixed electron-beam resist composed of a positive resist (ZEP520A) and C60 fullerene. The addition of C60 to the ZEP resist changes the material properties under electron beam exposure significantly. An improvement in the thermal resistance of the mixed material has been demonstrated by fabricating multimode interference couplers and coupling regions of microring resonators. The fabrication of distributed Bragg reflector structures has shown improvement in terms of pattern definition accuracy with respect to the same structures fabricated with normal ZEP resist. Straight InP membrane waveguides with different lengths have been fabricated using this mixed resist. A decrease of the propagation loss from 6.6 to 3.3dB/cm has been demonstrated.

© 2014 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7370) Optical devices : Waveguides
(110.4235) Imaging systems : Nanolithography

ToC Category:
Optical Devices

History
Original Manuscript: January 27, 2014
Revised Manuscript: February 16, 2014
Manuscript Accepted: February 16, 2014
Published: March 13, 2014

Citation
Yuqing Jiao, Josselin Pello, Alonso Millan Mejia, Longfei Shen, Barry Smalbrugge, Erik Jan Geluk, Meint Smit, and Jos van der Tol, "Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices," Opt. Lett. 39, 1645-1648 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-6-1645


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. M. Haurylau, G. Chen, H. Chen, J. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, IEEE J. Sel. Top. Quantum Electron. 12, 1699 (2006). [CrossRef]
  2. J. van der Tol, R. Zhang, J. Pello, F. Bordas, G. Roelkens, H. Ambrosius, P. Thijs, F. Karouta, and M. Smit, IET Optoelectron. 5, 218 (2011). [CrossRef]
  3. D. Liang, G. Roelkens, R. Baets, and J. Bowers, Materials 3, 1782 (2010). [CrossRef]
  4. S. Assefa, F. Xia, and Y. A. Vlasov, Nature 464, 80 (2010). [CrossRef]
  5. T. Ishii and K. Shigehara, in Hybrid Nanocomposites for Nanotechnology, L. Merhari, ed. (Springer, 2009), pp. 387–427.
  6. K. Inoue, D. Plumwongrot, N. Nishiyama, S. Sakamoto, H. Enomoto, S. Tamura, T. Maruyama, and S. Arai, Jpn. J. Appl. Phys. 48, 030208 (2009). [CrossRef]
  7. J. Lee, Y. Maeda, Y. Atsumi, Y. Takino, N. Nishiyama, and S. Arai, Jpn. J. Appl. Phys. 51, 042201 (2012). [CrossRef]
  8. R. S. Ruoff, D. S. Tse, R. Malhotra, and D. C. Lorents, J. Phys. Chem. 97, 3379 (1993). [CrossRef]
  9. S. Keyvaninia, M. Muneeb, S. Stankovi, P. J. Van Veldhoven, D. Van Thourhout, and G. Roelkens, Opt. Mater. Express 3, 35 (2013). [CrossRef]
  10. D. Taillaert, W. Bogaerts, P. Bienstman, T. F. Krauss, P. van Daele, I. Moerman, S. Verstuyft, K. De Mesel, and R. Baets, IEEE J. Quantum Electron. 38, 949 (2002). [CrossRef]
  11. J. Pello, M. Muneeb, S. Keyvaninia, J. J. G. M. van der Tol, G. Roelkens, and M. K. Smit, IEEE Photon. Technol. Lett. 25, 1969 (2013). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited