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Preferential chemical etching of blazed gratings in (110)-oriented GaAs

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Abstract

Blazed gratings with a theoretical blaze angle of 35°16′ are etched into (110) GaAs surfaces by preferential chemical etching, using a photoresist mask. A maximum total diffraction efficiency of 15% was measured at 6328 Å from a blazed grating with a 2.23-μm period, and the diffracted light was concentrated in a single order. To demonstrate the applicability of such gratings in integrated optics, gratings with periods in a 3000- to 5000-Å range were made, and epitaxial growth on (110) GaAs substrates was carried out using a method of growth that deposits high-quality, nearly defect-free layers on such substrates.

© 1979 Optical Society of America

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