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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 6, Iss. 11 — Nov. 1, 1981
  • pp: 563–565

Optical reflectance technique for observations of submonolayer adsorbed films

V. Daneu, R. M. Osgood, Jr., and D. J. Ehrlich  »View Author Affiliations


Optics Letters, Vol. 6, Issue 11, pp. 563-565 (1981)
http://dx.doi.org/10.1364/OL.6.000563


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Abstract

An optical technique is described for detecting and measuring thicknesses of adsorbed films with subangstrom sensitivity. The technique relies on optical interference from an antireflecting thin-film structure that is predeposited on a transparent cell window: the reflectivity of the window depends linearly on the thickness of the molecular layer adsorbed from the gas in the cell.

© 1981 Optical Society of America

History
Original Manuscript: June 11, 1981
Revised Manuscript: August 10, 1981
Published: November 1, 1981

Citation
V. Daneu, R. M. Osgood, and D. J. Ehrlich, "Optical reflectance technique for observations of submonolayer adsorbed films," Opt. Lett. 6, 563-565 (1981)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-6-11-563


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References

  1. J. G. Dash, Films on Solid Surfaces (Academic, New York, 1975).
  2. A. M. Bradshaw, F. M. Hoffmann, Surf. Sci. 72, 513 (1978). [CrossRef]
  3. V. Daneu, Appl. Opt. 14, 962 (1975). [PubMed]
  4. O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1976).
  5. This result, independent of the indices used for AR film and substrate, also holds for a complex transparent multilayer structure, for which the detuning from Rmin to Ropt is achieved by a change in the thickness of the outermost film.
  6. G. Quentel, R. Kern, Surf. Sci. 55, 545 (1976). [CrossRef]
  7. D. J. Ehrlich, R. M. Osgood, Chem. Phys. Lett. 79, 381 (1981). [CrossRef]
  8. L. I. Osipow, Surface Chemistry (Krieger, Huntington, W. Va., 1972).

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