Optical reflectance technique for observations of submonolayer adsorbed films
Optics Letters, Vol. 6, Issue 11, pp. 563-565 (1981)
http://dx.doi.org/10.1364/OL.6.000563
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Abstract
An optical technique is described for detecting and measuring thicknesses of adsorbed films with subangstrom sensitivity. The technique relies on optical interference from an antireflecting thin-film structure that is predeposited on a transparent cell window: the reflectivity of the window depends linearly on the thickness of the molecular layer adsorbed from the gas in the cell.
© 1981 Optical Society of America
Citation
V. Daneu, R. M. Osgood, Jr., and D. J. Ehrlich, "Optical reflectance technique for observations of submonolayer adsorbed films," Opt. Lett. 6, 563-565 (1981)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-6-11-563
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