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Spectroscopic characterization of highly doped ZnO films grown by atomic-layer deposition for three-dimensional infrared metamaterials [Invited]Andreas Frölich and Martin Wegener »View Author Affiliations
Andreas Frölich*
and Martin Wegener
DFG-Center for Functional Nanostructures (CFN), Institut für Angewandte Physik, and Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), D-76128 Karlsruhe, Germany *Corresponding author: Andreas.froelich@kit.edu |
Optical Materials Express, Vol. 1, Issue 5, pp. 883-889 (2011)
http://dx.doi.org/10.1364/OME.1.000883
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Abstract
We systematically study the optical spectra of ZnO grown by atomic-layer deposition as a function of Al (and Ti) doping concentration. The spectra measured on films are well described by fits using a Drude free-electron model. The derived plasma frequencies are consistent with the expected amount of doping and can be continuously and controllably tuned from small values to about 400 THz. The losses (damping) are also quantified. In addition, we achieve smooth conformal coatings of three-dimensional polymer templates made by direct laser writing. Altogether, Al:ZnO appears as an attractive “tunable metal” for three-dimensional infrared metamaterials or transformation-optics architectures.
© 2011 OSA
OCIS Codes
(160.4760) Materials : Optical properties
(310.3840) Thin films : Materials and process characterization
(160.3918) Materials : Metamaterials
ToC Category:
Metamaterials
History
Original Manuscript: June 2, 2011
Revised Manuscript: July 22, 2011
Manuscript Accepted: July 22, 2011
Published: August 8, 2011
Virtual Issues
Nanoplasmonics and Metamaterials (2011) Optical Materials Express
Citation
Andreas Frölich and Martin Wegener, "Spectroscopic characterization of highly doped ZnO films grown by atomic-layer deposition for three-dimensional infrared metamaterials [Invited]," Opt. Mater. Express 1, 883-889 (2011)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-1-5-883
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References
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- M. Scharrer, X. Wu, A. Yamilov, H. Cao, and R. P. H. Chang, “Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition,” Appl. Phys. Lett. 86(15), 151113 (2005). [CrossRef]
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- C. H. Ahn, H. Kim, and H. K. Cho, “Deposition of Al doped ZnO layers with various electrical types by atomic layer deposition,” Thin Solid Films 519(2), 747–750 (2010). [CrossRef]
- K.-S. An, W. Cho, B. K. Lee, S. S. Lee, and C. G. Kim, “Atomic layer deposition of undoped and Al-doped ZnO thin films using the Zn alkoxide precursor methylzinc isopropoxide,” J. Nanosci. Nanotechnol. 8(9), 4856–4859 (2008). [CrossRef] [PubMed]
- J. Y. Kim, Y.-J. Choi, H.-H. Park, S. Golledge, and D. C. Johnson, “Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films,” J. Vac. Sci. Technol. A 28(5), 1111–1114 (2010). [CrossRef]
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- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
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- I. Staude, G. von Freymann, S. Essig, K. Busch, and M. Wegener, “Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion,” Opt. Lett. 36(1), 67–69 (2011). [CrossRef] [PubMed]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- X. Yu, Y.-J. Lee, R. Furstenberg, J. O. White, and P. V. Braun, “Filling fraction dependent properties of inverse opal metallic photonic crystals,” Adv. Mater. 19(13), 1689–1692 (2007). [CrossRef]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- J. W. Elam and S. M. George, “Growth of ZnO/Al2O3 alloy films using atomic layer deposition techniques,” Chem. Mater. 15(4), 1020–1028 (2003). [CrossRef]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- A. Radke, T. Gissibl, T. Klotzbücher, P. V. Braun, and H. Giessen, “Three‐dimensional bichiral plasmonic crystals fabricated by direct laser writing and electroless silver plating,” Adv. Mater. 23(17), 3018–3021 (2011).
- A. Radke, T. Gissibl, T. Klotzbücher, P. V. Braun, and H. Giessen, “Three‐dimensional bichiral plasmonic crystals fabricated by direct laser writing and electroless silver plating,” Adv. Mater. 23(17), 3018–3021 (2011).
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- J. Y. Kim, Y.-J. Choi, H.-H. Park, S. Golledge, and D. C. Johnson, “Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films,” J. Vac. Sci. Technol. A 28(5), 1111–1114 (2010). [CrossRef]
- B. S. Lim, A. Rahtu, and R. G. Gordon, “Atomic layer deposition of transition metals,” Nat. Mater. 2(11), 749–754 (2003). [CrossRef] [PubMed]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- A. Niskanen, T. Hatanpää, K. Arstila, M. Leskelä, and M. Ritala, “Radical‐enhanced atomic layer deposition of silver thin films using phosphine‐adducted silver carboxylates,” Chem. Vap. Deposition. 13(8), 408–413 (2007). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photonics Rev. 4(6), 795–808 (2010). [CrossRef]
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- S. Keun Kim, C. Seong Hwang, S.-H. Ko Park, and S. Jin Yun, “Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant,” Thin Solid Films 478(1-2), 103–108 (2005). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- J. Y. Kim, Y.-J. Choi, H.-H. Park, S. Golledge, and D. C. Johnson, “Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films,” J. Vac. Sci. Technol. A 28(5), 1111–1114 (2010). [CrossRef]
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- S. Keun Kim, C. Seong Hwang, S.-H. Ko Park, and S. Jin Yun, “Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant,” Thin Solid Films 478(1-2), 103–108 (2005). [CrossRef]
- K.-S. An, W. Cho, B. K. Lee, S. S. Lee, and C. G. Kim, “Atomic layer deposition of undoped and Al-doped ZnO thin films using the Zn alkoxide precursor methylzinc isopropoxide,” J. Nanosci. Nanotechnol. 8(9), 4856–4859 (2008). [CrossRef] [PubMed]
- C. H. Ahn, H. Kim, and H. K. Cho, “Deposition of Al doped ZnO layers with various electrical types by atomic layer deposition,” Thin Solid Films 519(2), 747–750 (2010). [CrossRef]
- J. Y. Kim, Y.-J. Choi, H.-H. Park, S. Golledge, and D. C. Johnson, “Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films,” J. Vac. Sci. Technol. A 28(5), 1111–1114 (2010). [CrossRef]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- R. Malureanu, A. Alabastri, W. Cheng, R. Kiyan, B. Chichkov, A. Andryieuski, and A. Lavrinenko, “Enhanced broadband optical transmission in metallized woodpiles,” Appl. Phys. A 103(3), 749–753 (2011).
- A. Radke, T. Gissibl, T. Klotzbücher, P. V. Braun, and H. Giessen, “Three‐dimensional bichiral plasmonic crystals fabricated by direct laser writing and electroless silver plating,” Adv. Mater. 23(17), 3018–3021 (2011).
- S. Keun Kim, C. Seong Hwang, S.-H. Ko Park, and S. Jin Yun, “Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant,” Thin Solid Films 478(1-2), 103–108 (2005). [CrossRef]
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- S. J. Kwon, “Effect of precursor-pulse on properties of Al-doped ZnO films grown by atomic layer deposition,” Jpn. J. Appl. Phys. 44(2), 1062–1066 (2005). [CrossRef]
- R. Malureanu, A. Alabastri, W. Cheng, R. Kiyan, B. Chichkov, A. Andryieuski, and A. Lavrinenko, “Enhanced broadband optical transmission in metallized woodpiles,” Appl. Phys. A 103(3), 749–753 (2011).
- K.-S. An, W. Cho, B. K. Lee, S. S. Lee, and C. G. Kim, “Atomic layer deposition of undoped and Al-doped ZnO thin films using the Zn alkoxide precursor methylzinc isopropoxide,” J. Nanosci. Nanotechnol. 8(9), 4856–4859 (2008). [CrossRef] [PubMed]
- P. Banerjee, W.-J. Lee, K.-R. Bae, S. B. Lee, and G. W. Rubloff, “Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films,” J. Appl. Phys. 108(4), 043504 (2010). [CrossRef]
- K.-S. An, W. Cho, B. K. Lee, S. S. Lee, and C. G. Kim, “Atomic layer deposition of undoped and Al-doped ZnO thin films using the Zn alkoxide precursor methylzinc isopropoxide,” J. Nanosci. Nanotechnol. 8(9), 4856–4859 (2008). [CrossRef] [PubMed]
- P. Banerjee, W.-J. Lee, K.-R. Bae, S. B. Lee, and G. W. Rubloff, “Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films,” J. Appl. Phys. 108(4), 043504 (2010). [CrossRef]
- X. Yu, Y.-J. Lee, R. Furstenberg, J. O. White, and P. V. Braun, “Filling fraction dependent properties of inverse opal metallic photonic crystals,” Adv. Mater. 19(13), 1689–1692 (2007). [CrossRef]
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- A. Niskanen, T. Hatanpää, K. Arstila, M. Leskelä, and M. Ritala, “Radical‐enhanced atomic layer deposition of silver thin films using phosphine‐adducted silver carboxylates,” Chem. Vap. Deposition. 13(8), 408–413 (2007). [CrossRef]
- B. S. Lim, A. Rahtu, and R. G. Gordon, “Atomic layer deposition of transition metals,” Nat. Mater. 2(11), 749–754 (2003). [CrossRef] [PubMed]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- V. Lujala, J. Skarp, M. Tammenmaa, and T. Suntola, “Atomic layer epitaxy growth of doped zinc oxide thin films from organometals,” Appl. Surf. Sci. 82–83, 34–40 (1994). [CrossRef]
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- R. Malureanu, A. Alabastri, W. Cheng, R. Kiyan, B. Chichkov, A. Andryieuski, and A. Lavrinenko, “Enhanced broadband optical transmission in metallized woodpiles,” Appl. Phys. A 103(3), 749–753 (2011).
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- J.-S. Na, G. Scarel, and G. N. Parsons, “In situ analysis of dopant incorporation, activation, and film growth during thin film ZnO and ZnO:Al atomic layer deposition,” J. Phys. Chem. C 114(1), 383–388 (2010). [CrossRef]
- G. V. Naik and A. Boltasseva, “A comparative study of semiconductor-based plasmonic metamaterials,” Metamaterials 5(1), 1–7 (2011). [CrossRef]
- P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photonics Rev. 4(6), 795–808 (2010). [CrossRef]
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- A. Niskanen, T. Hatanpää, K. Arstila, M. Leskelä, and M. Ritala, “Radical‐enhanced atomic layer deposition of silver thin films using phosphine‐adducted silver carboxylates,” Chem. Vap. Deposition. 13(8), 408–413 (2007). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- J. Y. Kim, Y.-J. Choi, H.-H. Park, S. Golledge, and D. C. Johnson, “Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films,” J. Vac. Sci. Technol. A 28(5), 1111–1114 (2010). [CrossRef]
- J.-S. Na, G. Scarel, and G. N. Parsons, “In situ analysis of dopant incorporation, activation, and film growth during thin film ZnO and ZnO:Al atomic layer deposition,” J. Phys. Chem. C 114(1), 383–388 (2010). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- A. Radke, T. Gissibl, T. Klotzbücher, P. V. Braun, and H. Giessen, “Three‐dimensional bichiral plasmonic crystals fabricated by direct laser writing and electroless silver plating,” Adv. Mater. 23(17), 3018–3021 (2011).
- B. S. Lim, A. Rahtu, and R. G. Gordon, “Atomic layer deposition of transition metals,” Nat. Mater. 2(11), 749–754 (2003). [CrossRef] [PubMed]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- A. Niskanen, T. Hatanpää, K. Arstila, M. Leskelä, and M. Ritala, “Radical‐enhanced atomic layer deposition of silver thin films using phosphine‐adducted silver carboxylates,” Chem. Vap. Deposition. 13(8), 408–413 (2007). [CrossRef]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- P. Banerjee, W.-J. Lee, K.-R. Bae, S. B. Lee, and G. W. Rubloff, “Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films,” J. Appl. Phys. 108(4), 043504 (2010). [CrossRef]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- J.-S. Na, G. Scarel, and G. N. Parsons, “In situ analysis of dopant incorporation, activation, and film growth during thin film ZnO and ZnO:Al atomic layer deposition,” J. Phys. Chem. C 114(1), 383–388 (2010). [CrossRef]
- M. Scharrer, X. Wu, A. Yamilov, H. Cao, and R. P. H. Chang, “Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition,” Appl. Phys. Lett. 86(15), 151113 (2005). [CrossRef]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- S. Keun Kim, C. Seong Hwang, S.-H. Ko Park, and S. Jin Yun, “Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant,” Thin Solid Films 478(1-2), 103–108 (2005). [CrossRef]
- P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photonics Rev. 4(6), 795–808 (2010). [CrossRef]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- V. Lujala, J. Skarp, M. Tammenmaa, and T. Suntola, “Atomic layer epitaxy growth of doped zinc oxide thin films from organometals,” Appl. Surf. Sci. 82–83, 34–40 (1994). [CrossRef]
- I. Staude, G. von Freymann, S. Essig, K. Busch, and M. Wegener, “Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion,” Opt. Lett. 36(1), 67–69 (2011). [CrossRef] [PubMed]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- V. Lujala, J. Skarp, M. Tammenmaa, and T. Suntola, “Atomic layer epitaxy growth of doped zinc oxide thin films from organometals,” Appl. Surf. Sci. 82–83, 34–40 (1994). [CrossRef]
- V. Lujala, J. Skarp, M. Tammenmaa, and T. Suntola, “Atomic layer epitaxy growth of doped zinc oxide thin films from organometals,” Appl. Surf. Sci. 82–83, 34–40 (1994). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- I. Staude, G. von Freymann, S. Essig, K. Busch, and M. Wegener, “Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion,” Opt. Lett. 36(1), 67–69 (2011). [CrossRef] [PubMed]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- I. Staude, G. von Freymann, S. Essig, K. Busch, and M. Wegener, “Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion,” Opt. Lett. 36(1), 67–69 (2011). [CrossRef] [PubMed]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
- P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photonics Rev. 4(6), 795–808 (2010). [CrossRef]
- X. Yu, Y.-J. Lee, R. Furstenberg, J. O. White, and P. V. Braun, “Filling fraction dependent properties of inverse opal metallic photonic crystals,” Adv. Mater. 19(13), 1689–1692 (2007). [CrossRef]
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
- M. Scharrer, X. Wu, A. Yamilov, H. Cao, and R. P. H. Chang, “Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition,” Appl. Phys. Lett. 86(15), 151113 (2005). [CrossRef]
- M. Scharrer, X. Wu, A. Yamilov, H. Cao, and R. P. H. Chang, “Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition,” Appl. Phys. Lett. 86(15), 151113 (2005). [CrossRef]
- X. Yu, Y.-J. Lee, R. Furstenberg, J. O. White, and P. V. Braun, “Filling fraction dependent properties of inverse opal metallic photonic crystals,” Adv. Mater. 19(13), 1689–1692 (2007). [CrossRef]
Adv. Mater.
- X. Yu, Y.-J. Lee, R. Furstenberg, J. O. White, and P. V. Braun, “Filling fraction dependent properties of inverse opal metallic photonic crystals,” Adv. Mater. 19(13), 1689–1692 (2007). [CrossRef]
- A. Radke, T. Gissibl, T. Klotzbücher, P. V. Braun, and H. Giessen, “Three‐dimensional bichiral plasmonic crystals fabricated by direct laser writing and electroless silver plating,” Adv. Mater. 23(17), 3018–3021 (2011).
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, “Infiltration and inversion of holographically defined polymer photonic crystal templates by atomic layer deposition,” Adv. Mater. 18(12), 1561–1565 (2006). [CrossRef]
- N. Tétreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Pérez-Willard, S. John, M. Wegener, and G. A. Ozin, “New route to three-dimensional photonic bandgap materials: silicon double inversion of polymer templates,” Adv. Mater. 18(4), 457–460 (2006). [CrossRef]
Appl. Phys. A
- R. Malureanu, A. Alabastri, W. Cheng, R. Kiyan, B. Chichkov, A. Andryieuski, and A. Lavrinenko, “Enhanced broadband optical transmission in metallized woodpiles,” Appl. Phys. A 103(3), 749–753 (2011).
Appl. Phys. B
- C. E. Kriegler, M. S. Rill, M. Thiel, E. Müller, S. Essig, A. Frölich, G. Freymann, S. Linden, D. Gerthsen, H. Hahn, K. Busch, and M. Wegener, “Transition between corrugated metal films and split-ring-resonator arrays,” Appl. Phys. B 96(4), 749–755 (2009). [CrossRef]
Appl. Phys. Lett.
- M. Scharrer, X. Wu, A. Yamilov, H. Cao, and R. P. H. Chang, “Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition,” Appl. Phys. Lett. 86(15), 151113 (2005). [CrossRef]
Appl. Surf. Sci.
- V. Lujala, J. Skarp, M. Tammenmaa, and T. Suntola, “Atomic layer epitaxy growth of doped zinc oxide thin films from organometals,” Appl. Surf. Sci. 82–83, 34–40 (1994). [CrossRef]
Chem. Mater.
- M. Kariniemi, J. Niinistö, T. Hatanpää, M. Kemell, T. Sajavaara, M. Ritala, and M. Leskelä, “Plasma-enhanced atomic layer deposition of silver thin films,” Chem. Mater. 23(11), 2901–2907 (2011).
- J. W. Elam and S. M. George, “Growth of ZnO/Al2O3 alloy films using atomic layer deposition techniques,” Chem. Mater. 15(4), 1020–1028 (2003). [CrossRef]
Chem. Vap. Deposition.
- A. Niskanen, T. Hatanpää, K. Arstila, M. Leskelä, and M. Ritala, “Radical‐enhanced atomic layer deposition of silver thin films using phosphine‐adducted silver carboxylates,” Chem. Vap. Deposition. 13(8), 408–413 (2007). [CrossRef]
J. Appl. Phys.
- P. Banerjee, W.-J. Lee, K.-R. Bae, S. B. Lee, and G. W. Rubloff, “Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films,” J. Appl. Phys. 108(4), 043504 (2010). [CrossRef]
J. Nanosci. Nanotechnol.
- K.-S. An, W. Cho, B. K. Lee, S. S. Lee, and C. G. Kim, “Atomic layer deposition of undoped and Al-doped ZnO thin films using the Zn alkoxide precursor methylzinc isopropoxide,” J. Nanosci. Nanotechnol. 8(9), 4856–4859 (2008). [CrossRef] [PubMed]
J. Phys. Chem. C
- J.-S. Na, G. Scarel, and G. N. Parsons, “In situ analysis of dopant incorporation, activation, and film growth during thin film ZnO and ZnO:Al atomic layer deposition,” J. Phys. Chem. C 114(1), 383–388 (2010). [CrossRef]
J. Vac. Sci. Technol. A
- J. Y. Kim, Y.-J. Choi, H.-H. Park, S. Golledge, and D. C. Johnson, “Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films,” J. Vac. Sci. Technol. A 28(5), 1111–1114 (2010). [CrossRef]
Jpn. J. Appl. Phys.
- S. J. Kwon, “Effect of precursor-pulse on properties of Al-doped ZnO films grown by atomic layer deposition,” Jpn. J. Appl. Phys. 44(2), 1062–1066 (2005). [CrossRef]
Laser Photonics Rev.
- P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photonics Rev. 4(6), 795–808 (2010). [CrossRef]
Mater. Sci. Eng. B
- G. Luka, L. Wachnicki, B. S. Witkowski, T. A. Krajewski, R. Jakiela, E. Guziewicz, and M. Godlewski, “The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition,” Mater. Sci. Eng. B 176(3), 237–241 (2011). [CrossRef]
Metamaterials
- G. V. Naik and A. Boltasseva, “A comparative study of semiconductor-based plasmonic metamaterials,” Metamaterials 5(1), 1–7 (2011). [CrossRef]
Nat. Mater.
- M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, and M. Wegener, “Photonic metamaterials by direct laser writing and silver chemical vapour deposition,” Nat. Mater. 7(7), 543–546 (2008). [CrossRef] [PubMed]
- B. S. Lim, A. Rahtu, and R. G. Gordon, “Atomic layer deposition of transition metals,” Nat. Mater. 2(11), 749–754 (2003). [CrossRef] [PubMed]
Opt. Express
- F. Formanek, N. Takeyasu, T. Tanaka, K. Chiyoda, A. Ishikawa, and S. Kawata, “Three-dimensional fabrication of metallic nanostructures over large areas by two-photon polymerization,” Opt. Express 14(2), 800–809 (2006). [CrossRef] [PubMed]
- J. Li, M. M. Hossain, B. Jia, D. Buso, and M. Gu, “Three-dimensional hybrid photonic crystals merged with localized plasmon resonances,” Opt. Express 18(5), 4491–4498 (2010). [CrossRef] [PubMed]
Opt. Lett.
- I. Staude, G. von Freymann, S. Essig, K. Busch, and M. Wegener, “Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion,” Opt. Lett. 36(1), 67–69 (2011). [CrossRef] [PubMed]
Science
- A. Boltasseva and H. A. Atwater, “Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011). [CrossRef] [PubMed]
- J. K. Gansel, M. Thiel, M. S. Rill, M. Decker, K. Bade, V. Saile, G. von Freymann, S. Linden, and M. Wegener, “Gold helix photonic metamaterial as broadband circular polarizer,” Science 325(5947), 1513–1515 (2009). [CrossRef] [PubMed]
Thin Solid Films
- S. Keun Kim, C. Seong Hwang, S.-H. Ko Park, and S. Jin Yun, “Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant,” Thin Solid Films 478(1-2), 103–108 (2005). [CrossRef]
- C. H. Ahn, H. Kim, and H. K. Cho, “Deposition of Al doped ZnO layers with various electrical types by atomic layer deposition,” Thin Solid Films 519(2), 747–750 (2010). [CrossRef]
2011, Boltasseva, Science
- A. Boltasseva and H. A. Atwater, “Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011). [CrossRef] [PubMed]
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