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Two-photon polymerization technique with sub-50 nm resolution by sub-10 fs laser pulses |
Optical Materials Express, Vol. 2, Issue 7, pp. 942-947 (2012)
http://dx.doi.org/10.1364/OME.2.000942
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Abstract
Nanofabrication of structures with a feature size of sub-50 nm with ultrashort-laser based two-photon polymerization (2PP) technique is presented. The spatial resolution of the 2PP structures depends on the characteristics of the polymer material and the laser system used for fabrication. Here we compare the successful creation of sub-100 nm structures with two different few-cycle laser systems and chemically modified zirconium-based sol-gel composite material using cross-linker for resolution enhancement.
© 2012 OSA
OCIS Codes
(160.6060) Materials : Solgel
(320.7160) Ultrafast optics : Ultrafast technology
(350.3390) Other areas of optics : Laser materials processing
(350.5730) Other areas of optics : Resolution
(160.5335) Materials : Photosensitive materials
(310.6628) Thin films : Subwavelength structures, nanostructures
ToC Category:
Thin Films
History
Original Manuscript: April 16, 2012
Revised Manuscript: June 8, 2012
Manuscript Accepted: June 13, 2012
Published: June 20, 2012
Virtual Issues
Advances in Optical Materials (2012) Optical Materials Express
Citation
Moritz Emons, Kotaro Obata, Thomas Binhammer, Aleksandr Ovsianikov, Boris N. Chichkov, and Uwe Morgner, "Two-photon polymerization technique with sub-50 nm resolution by sub-10 fs laser pulses," Opt. Mater. Express 2, 942-947 (2012)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-2-7-942
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