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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 1, Iss. 1 — May. 1, 2011
  • pp: 101–107

Formation of antireflective nanostructures on melamine and N,N´-di (1-naphthyl)-N,N´-diphenyl benzidine (NPB)

U. Schulz, C. Präfke, P. Munzert, C. Gödeker, and N. Kaiser  »View Author Affiliations

Optical Materials Express, Vol. 1, Issue 1, pp. 101-107 (2011)

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Plasma-etched nanostructures are useful to provide antireflective properties to glass and plastic substrates. Organic compounds were deposited on glass substrates by thermal evaporation and etched by plasma emitted from an ion plasma source. A self-organized formation of surface structures takes place during etching of a layer of 1,3,5-Triazine-2,4,6-triamine (melamine). On the other hand, the surface of N,N´-di(1-naphthyl)-N,N´-diphenyl benzidine (NPB) remained smooth after etching. In this case, the structure formation was initiated by depositing a thin oxide layer on to the organic layer prior to the etching step. For both materials the etching process can be tailored to achieve antireflective properties over a desired wavelength range.

© 2011 OSA

OCIS Codes
(160.4890) Materials : Organic materials
(310.1210) Thin films : Antireflection coatings
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:

Original Manuscript: January 26, 2011
Revised Manuscript: February 16, 2011
Manuscript Accepted: February 17, 2011
Published: April 22, 2011

U. Schulz, C. Präfke, P. Munzert, C. Gödeker, and N. Kaiser, "Formation of antireflective nanostructures on melamine and N,N´-di (1-naphthyl)-N,N´-diphenyl benzidine (NPB)," Opt. Mater. Express 1, 101-107 (2011)

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