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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 1, Iss. 2 — Jun. 1, 2011
  • pp: 278–292

Optics InfoBase > Optical Materials Express > Volume 1 > Issue 2 > Page 278

Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases

O. Stenzel, S. Wilbrandt, S. Yulin, N. Kaiser, M. Held, A. Tünnermann, J. Biskupek, and U. Kaiser  »View Author Affiliations


Optical Materials Express, Vol. 1, Issue 2, pp. 278-292 (2011)
http://dx.doi.org/10.1364/OME.1.000278


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Abstract

Hafnium dioxide films have been produced by plasma ion assisted electron beam evaporation, utilizing argon or xenon as working gases. The optical constants of the layers have been investigated by spectrophotometry, while X-ray reflection measurements (XRR), energy dispersive X-ray spectroscopy (EDX), and transmission electron microscopy (TEM) have been performed with selected samples. The correlation between structural and optical properties is discussed. With respect to optical quality, the application of xenon as working gas results in coatings with higher refractive index and smaller surface roughness than the application of argon. This effect is attributed to a more efficient momentum transfer from high energetic working gas ions or atoms to hafnium atoms during deposition.

© 2011 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Thin Films

History
Original Manuscript: March 16, 2011
Revised Manuscript: May 12, 2011
Manuscript Accepted: May 18, 2011
Published: May 26, 2011

Virtual Issues
Advances in Optical Materials (2011) Optical Materials Express

Citation
O. Stenzel, S. Wilbrandt, S. Yulin, N. Kaiser, M. Held, A. Tünnermann, J. Biskupek, and U. Kaiser, "Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases," Opt. Mater. Express 1, 278-292 (2011)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-1-2-278


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