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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 1, Iss. 5 — Sep. 1, 2011
  • pp: 1034–1039

A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

Kris Ohlinger, Hualiang Zhang, Yuankun Lin, Di Xu, and Kevin P. Chen  »View Author Affiliations

Optical Materials Express, Vol. 1, Issue 5, pp. 1034-1039 (2011)

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Through the use of a multi-layer phase mask to produce five-beam interference, three-dimensional photonic crystals can be formed through single exposure to a photoresist. In these holographically formed structures, the interconnectivity is controlled by the relative phase difference among contributing beams. Photonic band gaps are calculated and the simulation shows a maximum bandgap of 18% of the middle gap frequency when the phase difference is optimized. A three-layer phase mask is fabricated by placing a spacer layer between two orthogonally-orientated gratings. The phase difference is controlled by thermal-tuning of the spacer thickness. Photonic crystal templates are holographically fabricated in a photosensitive polymer using the phase mask.

© 2011 OSA

OCIS Codes
(160.5293) Materials : Photonic bandgap materials
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Artificially Engineered Structures

Original Manuscript: June 7, 2011
Revised Manuscript: August 17, 2011
Manuscript Accepted: August 21, 2011
Published: August 24, 2011

Kris Ohlinger, Hualiang Zhang, Yuankun Lin, Di Xu, and Kevin P. Chen, "A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication," Opt. Mater. Express 1, 1034-1039 (2011)

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