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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 1, Iss. 6 — Oct. 1, 2011
  • pp: 1100–1112

Colored semi-transparent Cu-Si oxide thin films prepared by magnetron sputtering

J. Gil-Rosta, F. Yubero, R. Fernández, T. Vilajoana, P. Artús, J. C. Dürsteler, J. Cotrino, I. Ortega, and A. R. González-Elipe  »View Author Affiliations

Optical Materials Express, Vol. 1, Issue 6, pp. 1100-1112 (2011)

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Colored semi-transparent Cu-Si oxide thin films have been prepared by reactive magnetron sputtering from a single cathode of copper-silicon composition. Thin films of different composition and optical response were obtained by changing process parameters like the relative amount of copper in the target and the O2/Ar mixture of the reactive plasma gas. The film characteristics were analyzed by several techniques. Their optical properties (refractive index, absorption coefficient, color) have been correlated with the process parameters used in the film preparation as well as with the film stoichiometry and chemistry.

© 2011 OSA

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(330.4460) Vision, color, and visual optics : Ophthalmic optics and devices

ToC Category:
Thin Films

Original Manuscript: August 22, 2011
Revised Manuscript: September 2, 2011
Manuscript Accepted: September 2, 2011
Published: September 11, 2011

J. Gil-Rosta, F. Yubero, R. Fernández, T. Vilajoana, P. Artús, J. C. Dürsteler, J. Cotrino, I. Ortega, and A. R. González-Elipe, "Colored semi-transparent Cu-Si oxide thin films prepared by magnetron sputtering," Opt. Mater. Express 1, 1100-1112 (2011)

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