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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 1, Iss. 8 — Dec. 1, 2011
  • pp: 1548–1554

Selective electroless silver plating of three dimensional SU-8 microstructures on silicon for metamaterials applications

Yuanjun Yan, M. Ibnur Rashad, Ee Jin Teo, Hendrix Tanoto, Jinghua Teng, and Andrew A. Bettiol  »View Author Affiliations


Optical Materials Express, Vol. 1, Issue 8, pp. 1548-1554 (2011)
http://dx.doi.org/10.1364/OME.1.001548


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Abstract

We report a method for selective silver coating of SU-8 structures on Si substrates by treating the sample with radio frequency plasma prior to electroless plating. Silver films with high conductivity of 9 × 10−8Ω.m and low surface roughness of 9 nm have been obtained. When combined with two-photon lithography, this process can be utilized for three-dimensional metamaterials applications. Unlike previous work on selective coating, our process can coat directly on SU-8 photoresist that is widely used for two-photon lithography and does not require any resin modification.

© 2011 OSA

OCIS Codes
(160.3900) Materials : Metals
(160.3918) Materials : Metamaterials

ToC Category:
Metamaterials

History
Original Manuscript: September 29, 2011
Revised Manuscript: November 9, 2011
Manuscript Accepted: November 10, 2011
Published: November 11, 2011

Citation
Yuanjun Yan, M. Ibnur Rashad, Ee Jin Teo, Hendrix Tanoto, Jinghua Teng, and Andrew A. Bettiol, "Selective electroless silver plating of three dimensional SU-8 microstructures on silicon for metamaterials applications," Opt. Mater. Express 1, 1548-1554 (2011)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-1-8-1548


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