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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 2, Iss. 5 — May. 1, 2012
  • pp: 534–547

Diffusion coefficients of boron in vitreous silica at high temperatures

Johannes Kirchhof, Sonja Unger, Jan Dellith, Andy Scheffel, and Christian Teichmann  »View Author Affiliations


Optical Materials Express, Vol. 2, Issue 5, pp. 534-547 (2012)
http://dx.doi.org/10.1364/OME.2.000534


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Abstract

The diffusion of boron in yB2O3(1-y)SiO2 glasses with up to 8 mol% B2O3 was investigated by annealing doped layers on the inner surface of quartz glass tubes between 1700°C and 2000°C and measuring radial doping profiles by X-ray microprobe analysis and refractive index profiling subsequent to the tube collapse. By comparison with calculated profiles, diffusion coefficients could be determined and fitted by an Arrhenius function, where the preexponential D0 = 100.38 cm2s−1 is constant, but the activation energy decreases with increasing concentration according to E = (449-4.8∙c1.06) kJ∙mol−1 (c[mol% B2O3] = 100y).

© 2012 OSA

OCIS Codes
(160.2290) Materials : Fiber materials
(160.2750) Materials : Glass and other amorphous materials
(350.3850) Other areas of optics : Materials processing

ToC Category:
Semiconductors

History
Original Manuscript: February 10, 2012
Revised Manuscript: March 23, 2012
Manuscript Accepted: March 29, 2012
Published: April 4, 2012

Citation
Johannes Kirchhof, Sonja Unger, Jan Dellith, Andy Scheffel, and Christian Teichmann, "Diffusion coefficients of boron in vitreous silica at high temperatures," Opt. Mater. Express 2, 534-547 (2012)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-2-5-534


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