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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 2, Iss. 5 — May. 1, 2012
  • pp: 685–690

Direct photofabrication of various surface structures in photosensitive and transparent hybrid materials using organically modified silica nanoparticles and oligosiloxanes

Dong Jun Kang, Go Un Park, Hyeon Hwa Lee, and Hoy Yul Park  »View Author Affiliations

Optical Materials Express, Vol. 2, Issue 5, pp. 685-690 (2012)

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Hybrid materials composed of organically modified silica nanoparticles and oligosiloxanes exhibited homogeneous dispersion without any phase separation or aggregation and good solution processability. These hybrid materials exhibited good solubility of photoinitiator and high transmittance of above 90% in visible wavelength ranges. In particular, the materials showed high photocurability, with degrees of conversion under UV exposure above 90%. With high photosensitivity, the hybrid materials were used for direct photopatterning without the developing process used in the photomask method. The various optical surface structures on a micrometer scale were easily fabricated in the hybrid films upon UV exposure, and the samples exhibited good root-mean-square (RMS) roughness of around 1 nm.

© 2012 OSA

OCIS Codes
(160.6030) Materials : Silica
(160.6060) Materials : Solgel
(220.4610) Optical design and fabrication : Optical fabrication
(160.5335) Materials : Photosensitive materials

ToC Category:
Laser Materials Processing

Original Manuscript: March 30, 2012
Revised Manuscript: April 19, 2012
Manuscript Accepted: April 19, 2012
Published: April 24, 2012

Dong Jun Kang, Go Un Park, Hyeon Hwa Lee, and Hoy Yul Park, "Direct photofabrication of various surface structures in photosensitive and transparent hybrid materials using organically modified silica nanoparticles and oligosiloxanes," Opt. Mater. Express 2, 685-690 (2012)

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