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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 3, Iss. 11 — Nov. 1, 2013
  • pp: 1839–1854

Fluorine incorporation into porous silica by gas phase doping with C2F6 in N2

Frank Froehlich, Claudia Aichele, Stephan Grimm, and Kay Schuster  »View Author Affiliations


Optical Materials Express, Vol. 3, Issue 11, pp. 1839-1854 (2013)
http://dx.doi.org/10.1364/OME.3.001839


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Abstract

The incorporation of fluorine into porous silica by gas phase doping with hexafluoroethane C2F6 in N2 was studied using thermodynamic calculations and complementary fluorination experiments up to 1300 °C. With online FTIR analysis of the gas phase, the main products SiF4, CO2, CO, and CF4, and the traces H2O, HF, Si2F6O, and COF2 were detected and three consecutive kinetic phases deduced: the unique sorption phase, a combined etching and fluorination phase, and the thermal decomposition of C2F6 accompanied by a deposition of solid carbon. The chemical species were connected to a framework of chemical reactions. Carbon deposition and mass loss by etching are principle problems of this fluorine precursor, that cannot be completely avoided. According to the origin, three types of carbon can be distinguished. Because of its high thermodynamic stability, SiF4 is a key product of etching.

© 2013 Optical Society of America

OCIS Codes
(160.2290) Materials : Fiber materials
(160.2750) Materials : Glass and other amorphous materials
(160.4670) Materials : Optical materials
(160.6030) Materials : Silica
(300.6340) Spectroscopy : Spectroscopy, infrared
(350.3850) Other areas of optics : Materials processing

ToC Category:
Glass and Other Amorphous Materials

History
Original Manuscript: August 7, 2013
Revised Manuscript: September 21, 2013
Manuscript Accepted: September 23, 2013
Published: October 9, 2013

Citation
Frank Froehlich, Claudia Aichele, Stephan Grimm, and Kay Schuster, "Fluorine incorporation into porous silica by gas phase doping with C2F6 in N2," Opt. Mater. Express 3, 1839-1854 (2013)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-3-11-1839


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References

  1. A. Mühlich, K. Rau, F. Simmat, and N. Treber, “A new doped synthetic fused silica as bulk material for low-loss optical fibers,” presented at the First European Conference on Optical Fiber Communication, London (1975).
  2. K. Rau, A. Muehlich, F. Simat, and N. Treber, “Verfahren zur Herstellung eines Vorproduktes für die Erzeugung eines optischen Lichtleiters,” Patent DE 2538313A1, 1975.
  3. S. Shiraishi, K. Fujiwara, and S. Kurosaki, “An optical transmission fiber containing fluorine,” Patent US 4082420, 1976.
  4. J. W. Fleming and D. L. Wood, “Refractive index dispersion and related properties in fluorine doped silica,” Appl. Opt.22(19), 3102–3104 (1983). [CrossRef] [PubMed]
  5. M. Kyoto, Y. Ohoga, S. Ishikawa, and Y. Ishiguro, “Characterization of fluorine-doped silica glasses,” J. Mater. Sci.28(10), 2738–2744 (1993). [CrossRef]
  6. R. Clasen, Herstellung sehr reiner Kieselgläser durch Sintern submikroskopischer Glasteilchen (Habilation, RWTH Aachen, 1989).
  7. K. Abe, “Fluorine doped silica for optical waveguides,” presented at the 2. European Conf. Opt. Fibre Comm., Paris, 1976.
  8. K. L. Walker, R. Csenscit, and D. L. Wood, “The chemistry of fluorine incorporation in silica,” presented at the 6th Topical Meeting on Optical Communication, New Orleans, 1983.
  9. J. Kirchhof, P. Kleinert, S. Unger, and A. Funke, “About the fluorine chemistry in MCVD: The influence of fluorine doping in SiO2 deposition,” Cryst. Res. Technol.21(11), 1437–1444 (1986). [CrossRef]
  10. A. Mühlich, K. Rau, and N. Treber, “Preparation of fluorine doped silica preforms by plasma chemical technique,” presented at the 3. European Conf. Opt. Fibre Comm., München, 1977.
  11. P. Bachmann, H. Hübner, M. Lenartz, E. Steinbeck, and J. Ungelenk, “Fluorine doped single mode and step index fibres prepared by the low pressure PCVD process,” presented at the 8. European Conf. Opt. Fibre Comm., Cannes, 1982.
  12. H. Kanamori, N. Yoshioka, M. Kyoto, M. Watanabe, and G. Tanaka, “Fluorine doping in the VAD method and its application to optical fibre fabrication,” presented at the 9. European Conf. Opt. Fibre Comm., Geneva, 1983.
  13. P. C. Schultz and A. Sarkar, “Recent advances in the outside vapor deposition (OVD) process,” presented at the Fourth International Conference on Integrated Optics and Optical Fiber Communication, Tokyo, 1983.
  14. S. Sudo, T. Miya, and T. Nakahara, “Fabrication of fluorine doped VAD nother rod,” in Proc. National Convention of IECE of Japan, (Senai, Japan, 1983), .
  15. J. Kirchhof and S. Unger, “Thermodynamics of fluorine incorporation into silica glass,” J. Non-Cryst. Solids354(2-9), 540–545 (2008). [CrossRef]
  16. M. W. Chase, Jr., C. A. Davies, J. R. Downey, Jr., D. J. Frurip, R. A. McDonald, and A. N. Syverud, JANAF Thermochemical Tables, Third Edition (American Institute of Physics, Inc., New York, 1986).
  17. I. Barin, Thermochemical Data of Pure Substances, 2. Auflage (VCH, Weinheim, 1993).
  18. M. Shinmei, T. Imai, T. Yokokawa, and C. R. Masson, “Thermodynamic study of Si2OF6(g) from 723-1288 K by mass spectrometry,” J. Chem. Thermodyn.18(3), 241–246 (1986). [CrossRef]
  19. P. Dumas, J. Corset, Y. Levy, and V. Neuman, “Raman spectral characterization of pure and fluorine-doped vitreous silica material,” J. Raman Spectrosc.13(2), 134–138 (1982). [CrossRef]
  20. J. Kirchhof, S. Unger, B. Knappe, P. Kleinert, and A. Funke, “About the fluorine chemistry in MCVD: The mechanism of fluorine incorporation into SiO2 layers,” Cryst. Res. Technol.22(4), 495–501 (1987). [CrossRef]
  21. P. L. Hanst and S. T. Hanst, Infrared Spectra for Quantitative Analysis of Gases (Infrared Analysis, Inc., Anaheim, 2000).
  22. W. Hermann, A. Raith, and H. Rau, “Diffusion of fluorine in silica,” Ber. Bunsenges. Phys. Chem91(1), 56–58 (1987). [CrossRef]
  23. J. Kirchhof, P. Kleinert, W. Radloff, and E. Below, “Diffusion Processes in Lightguide Materials: The Diffusion of OH in Silica Glass at High Temperatures,” Phys. Status Solidi, A Appl. Res.101(2), 391–401 (1987). [CrossRef]
  24. A. Marshall and K. R. Hallam, “Fluorine doping and etching reactions of freon 12 in optical fiber manufacture,” J. Lightwave Technol.4(7), 746–750 (1986). [CrossRef]

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