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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 3, Iss. 5 — May. 1, 2013
  • pp: 546–555

Asymmetrical diffusion at interfaces of Mg/SiC multilayers

Haochuan Li, Jingtao Zhu, Zhanshan Wang, Zhuqing Song, and Hong Chen  »View Author Affiliations


Optical Materials Express, Vol. 3, Issue 5, pp. 546-555 (2013)
http://dx.doi.org/10.1364/OME.3.000546


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Abstract

Interfacial structure of Mg/SiC multilayers as extreme ultra-violet reflectors was studied along with Mg/Si and Mg/C multilayers by means of x-ray reflectometry, x-ray diffraction, x-ray photoemission spectroscopy, and transmission electron microscopy. The interfacial diffusion in the Mg/SiC multilayer is found asymmetrical as the interlayers formed at SiC-on-Mg interfaces (2.5 nm) are much thicker than those at Mg-on-SiC interfaces (1.0 nm). Contrary asymmetry is found in the Mg/Si and Mg/C multilayers. An explanation of this phenomenon is suggested based on the investigation results. Our findings may result in improved reflectance of Mg/SiC multilayers by inserting diffusion barriers at the more diffused interfaces.

© 2013 OSA

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.6870) Thin films : Thin films, other properties
(340.7470) X-ray optics : X-ray mirrors

ToC Category:
Thin Films

History
Original Manuscript: March 13, 2013
Revised Manuscript: March 27, 2013
Manuscript Accepted: March 29, 2013
Published: April 2, 2013

Citation
Haochuan Li, Jingtao Zhu, Zhanshan Wang, Zhuqing Song, and Hong Chen, "Asymmetrical diffusion at interfaces of Mg/SiC multilayers," Opt. Mater. Express 3, 546-555 (2013)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-3-5-546


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