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Optical Materials Express

Optical Materials Express

  • Editor: David J. Hagan
  • Vol. 3, Iss. 6 — Jun. 1, 2013
  • pp: 765–776

Effect of thermal anneal on growth behavior of laser-induced damage sites on the exit surface of fused silica

Rajesh N. Raman, Raluca A. Negres, Manyalibo J. Matthews, and Christopher W. Carr  »View Author Affiliations

Optical Materials Express, Vol. 3, Issue 6, pp. 765-776 (2013)

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Thermal anneal is known to arrest the growth of laser-induced damage in optical materials. However, the response of the material which leads to this observed behavior is poorly understood. In this work, we investigate the effect of isothermal anneal at 1100°C for 12 hours on the growth rate of laser-induced damage sites in fused silica. Growth rate was significantly lower for annealed initiated damage sites than that for untreated sites. This decrease in growth rate was associated with the closure of small surface and subsurface cracks, suggesting that aggressive growth rate is due, at least in part, to subsurface fracture complexity.

© 2013 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(160.6030) Materials : Silica
(180.0180) Microscopy : Microscopy
(240.6700) Optics at surfaces : Surfaces

ToC Category:
Laser-Induced Damage

Original Manuscript: March 26, 2013
Revised Manuscript: April 29, 2013
Manuscript Accepted: April 30, 2013
Published: May 10, 2013

Rajesh N. Raman, Raluca A. Negres, Manyalibo J. Matthews, and Christopher W. Carr, "Effect of thermal anneal on growth behavior of laser-induced damage sites on the exit surface of fused silica," Opt. Mater. Express 3, 765-776 (2013)

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