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Optical Materials Express

Optical Materials Express

  • Editor: David Hagan
  • Vol. 4, Iss. 4 — Apr. 1, 2014
  • pp: 764–775

Effects of cumulative ion bombardment on ITO films deposited on PET and Si substrates by DC magnetron sputtering

Kun-San Tseng and Yu-Lung Lo  »View Author Affiliations


Optical Materials Express, Vol. 4, Issue 4, pp. 764-775 (2014)
http://dx.doi.org/10.1364/OME.4.000764


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Abstract

Transparent conducting indium tin oxide (ITO) thin films are deposited on polyethylene terephthalate (PET) and silicon (Si) substrates by DC magnetron sputtering at room temperature. The electrical and optical properties of the ITO films are then investigated as a function of the cumulative sputtering gas; a parameter newly proposed in this study and defined as the product of the gas (argon) flow rate and the deposition time. The results show that the ITO films deposited on the PET substrates have an amorphous structure, while those deposited on the Si substrates have a microcrystalline structure. For both ITO films, a critical value of the cumulative sputtering gas parameter exists at which the minimum resistivity occurs due to a corresponding increase in the carrier density. For the ITO films deposited on the Si substrates, the carrier mobility is insensitive to the cumulative sputtering gas. However, for the ITO films deposited on the PET substrates, the carrier mobility reduces as the cumulative sputtering gas increases. For the ITO film on the PET substrate, the average transmittance in the visible range increases with an increasing argon flow rate given a constant deposition time. The optical band gap of the ITO films on the PET substrates located in the visible range reduces the transparency of these samples. Finally, for the ITO films deposited on PET substrates, a low resistivity can be obtained without any significant reduction in the transmittance of the ITO film by using the critical cumulative sputtering gas value as a deposition guideline in determining suitable values of the gas flow rate and deposition time.

© 2014 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.7005) Thin films : Transparent conductive coatings

ToC Category:
Thin Films

History
Original Manuscript: December 4, 2013
Revised Manuscript: March 16, 2014
Manuscript Accepted: March 19, 2014
Published: March 21, 2014

Citation
Kun-San Tseng and Yu-Lung Lo, "Effects of cumulative ion bombardment on ITO films deposited on PET and Si substrates by DC magnetron sputtering," Opt. Mater. Express 4, 764-775 (2014)
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-4-4-764


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References

  1. A. N. Banerjee and K. K. Chattopadhyay, “Recent developments in the emerging field of crystallite p-type transparent conducting oxide thin films,” Prog. Cryst. Growth. Ch.50(1-3), 52–105 (2005). [CrossRef]
  2. S. K. Bhagat, H. Han, Y. Zoo, J. Lewis, S. Grego, K. Lee, S. Iyer, and T. L. Alford, “Effects of deposition parameters on the electrical and mechanical properties of indium tin oxide films on polyethylene naphthalate substrates deposited by radio frequency magnetron sputtering,” Thin Solid Films516(12), 4064–4069 (2008). [CrossRef]
  3. M. C. Choi, Y. Kim, and C. S. Ha, “Polymers for flexible displays: From material selection to device applications,” Prog. Polym. Sci.33(6), 581–630 (2008). [CrossRef]
  4. A. K. Kulkarni, K. H. Schulz, T. S. Lim, and M. Khan, “Electrical, optical and structural characteristics of indium-tin-oxide thin films deposited on glass and polymer substrates,” Thin Solid Films308–309, 1–7 (1997). [CrossRef]
  5. A. K. Kulkarni, K. H. Schulz, T. S. Lim, and M. Khan, “Dependence of the sheet resistance of indium-tin-oxide thin films on grain size and grain orientation determined from X-ray diffraction techniques,” Thin Solid Films345(2), 273–277 (1999). [CrossRef]
  6. M. Dudek, A. Amassian, O. Zabeida, J. E. Klemberg-Sapieha, and L. Martinu, “Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering,” Thin Solid Films517(16), 4576–4582 (2009). [CrossRef]
  7. A. N. H. Al-Ajili and S. C. Bayliss, “A study of the optical, electrical and structural properties of reactively sputtered InOx and ITOx thin films,” Thin Solid Films305(1-2), 116–123 (1997). [CrossRef]
  8. Y. Shigesato, R. Koshi-ishi, T. Kawashima, and J. Ohsako, “Early stages of ITO deposition on glass or polymer substrates,” Vacuum59(2-3), 614–621 (2000). [CrossRef]
  9. Y. H. Son, J. H. Lee, and H. J. Kim, “Excimer laser crystallization of a-ITO thin film deposited on plastics,” J. Korean Phys. Soc.42, 814–816 (2003).
  10. L. J. Meng, E. Liang, J. Gao, V. Teixeira, and M. P. dos Santos, “Study of indium tin oxide thin films deposited on acrylics substrates by ion beam assisted deposition techniquE,” J, Nanosci. Nanotechno.9, 4151–4155 (2009).
  11. Z. Yu, Y. G. Li, F. Xia, Z. Zhao, and W. Xue, “Properties of indium tin oxide films deposited on unheated polymer substrates by ion beam assisted deposition,” Thin Solid Films517(18), 5395–5398 (2009). [CrossRef]
  12. Z. Yu, Y. G. Li, F. Xia, and W. Xue, “The characteristics of indium tin oxide films prepared on various buffer layer-coated polymer substrates,” Surf. Coat. Tech.204(1-2), 131–134 (2009). [CrossRef]
  13. H. Kim, J. S. Horwitz, G. P. Kushto, Z. H. Kafafi, and D. B. Chrisey, “Indium tin oxide thin films grown on flexible plastic substrates by pulsed-laser deposition for organic light-emitting diodes,” Appl. Phys. Lett.79(3), 284–286 (2001). [CrossRef]
  14. C. N. de Carvalho, A. Luis, O. Conde, E. Fortunato, G. Lavareda, and A. Amaral, “Effect of rf power on the properties of ITO thin films deposited by plasma enhanced reactive ther mal evaporation on unheated polymer substrates,” J. Non-Cryst. Solids299–302, 1208–1212 (2002). [CrossRef]
  15. C. N. de Carvalho, A. Luis, O. Conde, E. Fortunato, G. Lavareda, and A. Amaral, “Properties of ITO films deposited by r.f.-PERTE on unheated polymer substrates—dependence on oxygen partial pressure,” Thin Solid Films427(1-2), 215–218 (2003). [CrossRef]
  16. Y. F. Lan, H. R. Chang, and J. L. He, “Improvements of ITO film deposited on PET substrates by plasma-polymerized hydrogenated si-carbon-oxide buffer layer,” Jpn. J. Appl. Phys.49, 1–5 (2010). [CrossRef]
  17. G. E. Jellison and F. A. Modine, “Parameterization of the optical functions of amorphous materials in the interband region,” Appl. Phys. Lett.69(3), 371–373 (1996). [CrossRef]
  18. H. Fujiwara, Spectroscopic Ellipsometry Principle and Application (John Wiley and Sons, 2006).
  19. Y. S. Jung, “Spectroscopic ellipsometry studies on the optical constants of indium tin oxide films deposited under various sputtering conditions,” Thin Solid Films467(1-2), 36–42 (2004). [CrossRef]
  20. V. Craciun, D. Craciun, X. Wang, T. J. Anderson, and R. K. Singh, “Transparent and conducting indium oxide thin films grown by pulsed laser deposition at low temperatures,” J. Optoelectron. Adv. Mater.5, 401–408 (2003).
  21. H. Kim, C. M. Gilmore, A. Pique, J. S. Horwitz, H. Mattoussi, H. Murata, Z. H. Kafafi, and D. B. Cchrisey, “Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices,” J. Appl. Phys.86(11), 6451–6461 (1999). [CrossRef]
  22. F. Kurdesau, G. Khripunov, A. F. da Cunha, M. Kaelin, and A. N. Tiwari, “Comparative study of ITO layers deposited by DC and RF magnetron sputtering at room temperature,” J. Non-Cryst. Solids352(9-20), 1466–1470 (2006). [CrossRef]
  23. V. Teixeira, H. N. Cuia, L. J. Meng, E. Fortunato, and R. Martins, “Amorphous ITO thin films prepared by DC sputtering for electrochromic applications,” Thin Solid Films420-421, 70–75 (2002). [CrossRef]
  24. I. Hamberg and C. G. Granqvist, “Evaporated Sn-doped In2O3 films: Basic optical properties and application to energy-efficient windows,” J. Appl. Phys.60(11), R123–R159 (1986). [CrossRef]
  25. J. R. Bellingham, W. A. Phillip, and C. J. Adkins, “Electrical and optical properties of amorphous indium oxide,” J. Phys- Condens. Mat.2, 6207–6221 (1990).
  26. R. B. H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi, “Tin doped indium oxide thin film: Electrical properties,” J. Appl. Phys.83(5), 2631–2645 (1998). [CrossRef]

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