OSA's Digital Library

Optical Materials Express

Optical Materials Express

  • Editor: David Hagan
  • Vol. 4, Iss. 8 — Aug. 1, 2014
  • pp: 1696–1707

Optical properties of UV-transparent aluminum oxide / aluminum fluoride mixture films, prepared by plasma-ion assisted evaporation and ion beam sputtering

Olaf Stenzel, Steffen Wilbrandt, Shan Du, Christian Franke, Norbert Kaiser, Andreas Tünnermann, Mathias Mende, Henrik Ehlers, and Mario Held  »View Author Affiliations

Optical Materials Express, Vol. 4, Issue 8, pp. 1696-1707 (2014)

View Full Text Article

Enhanced HTML    Acrobat PDF (1107 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Electron beam evaporation (without and with plasma assistance) as well as ion beam sputtering are used to prepare optical mixture coatings for applications in the ultraviolet spectral range. It is demonstrated that intermixing aluminum oxide/ aluminum fluoride materials by these physical vapor deposition techniques results in optical coatings with flexible refractive indices varying between 1.40 and 1.75 in the deep ultraviolet spectral region. At the same time, extinction coefficients vary between less than 1x10−4 and 2x10−3. For evaporated layers, at certain mixture ratios, mechanical stress appears to be close to zero.

© 2014 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties
(310.4925) Thin films : Other properties (stress, chemical, etc.)

ToC Category:
Thin Films

Original Manuscript: June 12, 2014
Revised Manuscript: July 9, 2014
Manuscript Accepted: July 9, 2014
Published: July 22, 2014

Olaf Stenzel, Steffen Wilbrandt, Shan Du, Christian Franke, Norbert Kaiser, Andreas Tünnermann, Mathias Mende, Henrik Ehlers, and Mario Held, "Optical properties of UV-transparent aluminum oxide / aluminum fluoride mixture films, prepared by plasma-ion assisted evaporation and ion beam sputtering," Opt. Mater. Express 4, 1696-1707 (2014)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. M. Friz and F. Waibel, “Coating Materials,” in: Optical Interference Coatings, N. Kaiser and H. K. Pulker, Eds. (Springer-Verlag, 2003).
  2. R. Thielsch, “Optical Coatings for the DUV/VUV,” in: Optical Interference Coatings, N. Kaiser and H. K. Pulker, Eds. (Springer-Verlag, 2003).
  3. C. Zaczek, A. Pazidis, and H. Feldermann, in Optical Interference Coatings Topical Meeting, 2007 OSA Technical Digest Series (Optical Society of America 2007), FA1.
  4. M. Zukic, D. G. Torr, J. F. Spann, and M. R. Torr, “Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films,” Appl. Opt.29(28), 4284–4292 (1990). [CrossRef] [PubMed]
  5. C. Mühlig, W. Triebel, S. Kufert, and S. Bublitz, “Characterization of low losses in optical thin films and materials,” Appl. Opt.47(13), C135–C142 (2008). [CrossRef] [PubMed]
  6. J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, “193 nm laser induced luminescence in oxide thin films,” Appl. Phys. (Berl.)75(5), 637–640 (2002). [CrossRef]
  7. G. L. Harding, “Production and properties of high rate sputtered low index transparent dielectric materials based on aluminium-oxy-fluoride,” Sol. Energy Mater.12(3), 169–186 (1985). [CrossRef]
  8. R. Lewin, R. P. Howson, and C. A. Bishop, “Optical coatings for large area interference filters,” Vacuum37(3–4), 257–260 (1987). [CrossRef]
  9. C. E. Anderson and J. P. Rousseau, Transparent Substrate Provided With, Thin-film Coating, U.S. Patent 5,952,084 (1999).
  10. R. Korenstein, J. S. McCloy, P. E. Cremin, and R. W. Rustison, Durable antireflective multispectral infrared coatings, Patent 20100035036 (2010).
  11. W. Heitmann, “Vacuum evaporated films of aluminum fluoride,” Thin Solid Films5(1), 61–67 (1970). [CrossRef]
  12. F. Bridou, M. Cuniot-Ponsard, J.-M. Desvignes, M. Richter, U. Kroth, and A. Gottwald, “Experimental determination of optical constants of MgF2 and AlF3 thin films in the vacuum ultra-violet wavelength region (60–124nm), and its application to optical designs,” Opt. Commun.283(7), 1351–1358 (2010). [CrossRef]
  13. C. C. Lee, M. C. Liu, M. Kaneko, K. Nakahira, and Y. Takano, “Characterization of AlF3 thin films at 193 nm by thermal evaporation,” Appl. Opt.44(34), 7333–7338 (2005). [CrossRef] [PubMed]
  14. O. Stenzel, D. Gäbler, S. Wilbrandt, N. Kaiser, H. Steffen, and A. Ohl, “Plasma ion assisted deposition of aluminium oxide and aluminium oxifluoride layers for applications in the ultraviolet spectral range,” Opt. Mater.33(11), 1681–1687 (2011). [CrossRef]
  15. M. Bischoff, O. Stenzel, K. Friedrich, S. Wilbrandt, D. Gäbler, S. Mewes, and N. Kaiser, “Plasma-assisted deposition of metal fluoride coatings and modeling the extinction coefficient of as-deposited single layers,” Appl. Opt.50(9), C232–C238 (2011). [CrossRef] [PubMed]
  16. X. Li, W. Zhang, J. Sun, J. Liu, Y. Hou, L. Lin, K. He, and K. Yi, “Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films,” Appl. Surf. Sci.282, 226–230 (2013). [CrossRef]
  17. O. Stenzel, S. Wilbrandt, M. Schürmann, N. Kaiser, H. Ehlers, M. Mende, D. Ristau, S. Bruns, M. Vergöhl, M. Stolze, M. Held, H. Niederwald, T. Koch, W. Riggers, P. Burdack, G. Mark, R. Schäfer, S. Mewes, M. Bischoff, M. Arntzen, F. Eisenkrämer, M. Lappschies, S. Jakobs, S. Koch, B. Baumgarten, and A. Tünnermann, “Mixed oxide coatings for optics,” Appl. Opt.50(9), C69–C74 (2011). [CrossRef] [PubMed]
  18. M. Mende, I. Balasa, H. Ehlers, D. Ristau, D. B. Douti, L. Gallais, and M. Commandré, “Relation of optical properties and femtosecond laser damage resistance for Al2O3/AlF3 and Al2O3/SiO2 composite coatings,” Appl. Opt.53(4), A383–A391 (2014). [CrossRef] [PubMed]
  19. S. Wilbrandt, O. Stenzel, and N. Kaiser, “All-optical in-situ analysis of PIAD deposition processes,” Proc. SPIE7101, 71010 (2008). [CrossRef]
  20. O. Stenzel, S. Wilbrandt, K. Friedrich, and N. Kaiser, “„Realistische Modellierung der NIR/VIS/UV-optischen Konstanten dünner optischer Schichten im Rahmen des Oszillatormodells,” Vakuum in Forschung und Praxis21(5), 15–23 (2009). [CrossRef]
  21. O. Stenzel, S. Wilbrandt, N. Kaiser, M. Vinnichenko, F. Munnik, A. Kolitsch, A. Chuvilin, U. Kaiser, J. Ebert, S. Jakobs, A. Kaless, S. Wüthrich, O. Treichel, B. Wunderlich, M. Bitzer, and M. Grössl, “The correlation between mechanical stress, thermal shift and refractive index in HfO2, Nb2O5, Ta2O5 and SiO2 layers and its relation to the porosity,” Thin Solid Films517(21), 6058–6068 (2009). [CrossRef]
  22. P. W. Baumeister, Optical Coating Technology (SPIE Press Bellingham, 2004).
  23. A. Petzold and J. Ulbricht, Tonerde und Tonerdewerkstoffe (VEB Deutscher Verlag für Grundstoffindustrie, Leipzig, 1983).
  24. M. Held, Untersuchung maßgeschneiderter Nanokompositschichten für die Optik, PhD Thesis, in preparation.
  25. U. Kreibig and M. Vollmer, Optical Properties of Metal Clusters, Springer Series in Material Science 25 (Springer-Verlag, 1995).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited