OSA's Digital Library

Optical Materials Express

Optical Materials Express

  • Editor: David Hagan
  • Vol. 4, Iss. 9 — Sep. 1, 2014
  • pp: 1833–1847

Control of optical properties of TiNxOy films and application for high performance solar selective absorbing coatings

Feiliang Chen, Shao-Wei Wang, Liming Yu, Xiaoshuang Chen, and Wei Lu  »View Author Affiliations

Optical Materials Express, Vol. 4, Issue 9, pp. 1833-1847 (2014)

View Full Text Article

Enhanced HTML    Acrobat PDF (2117 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



TiNxOy films with controllable optical properties have been fabricated by reactive mid-frequency magnetron sputtering from titanium nitride target. The optical and electrical properties were studied as a function of the reactive gas flow and were correlated with the film stoichiometry. The results showed that the behavior of TiNxOy films can be adjusted from metallic to dielectric by increasing oxygen content, which is of great significance to their extensive applications. Owing to the accurate control of optical properties, a TiNxOy based solar selective absorbing coating has been designed and prepared with the aid of TiO2/Si3N4/SiO2 antireflection layers. Its solar absorbance is as high as 97.5% and thermal emissivity is 4.3% with total thickness of 230 nm. The solar absorbance can maintain above 90% for a broad incident angle range from 0° to 65°.

© 2014 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
(310.3915) Thin films : Metallic, opaque, and absorbing coatings

ToC Category:
Thin Films

Original Manuscript: June 3, 2014
Revised Manuscript: July 26, 2014
Manuscript Accepted: July 27, 2014
Published: August 12, 2014

Feiliang Chen, Shao-Wei Wang, Liming Yu, Xiaoshuang Chen, and Wei Lu, "Control of optical properties of TiNxOy films and application for high performance solar selective absorbing coatings," Opt. Mater. Express 4, 1833-1847 (2014)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. N. Martin, O. Banakh, A. M. E. Santo, S. Springer, R. Sanjines, J. Takadoum, and F. Levy, “Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique,” Appl. Surf. Sci.185(1-2), 123–133 (2001). [CrossRef]
  2. M. J. Jung, K. H. Nam, Y. M. Chung, J. H. Boo, and J. G. Han, “The physiochemical properties of TiOxNy films with controlled oxygen partial pressure,” Surf. Coat. Tech.171(1-3), 71–74 (2002). [CrossRef]
  3. M. Radecka, E. Pamula, A. Trenczek-Zajac, K. Zakrzewska, A. Brudnik, E. Kusior, N.-T. H. Kim-Ngan, and A. G. Balogh, “Chemical composition, crystallographic structure and impedance spectroscopy of titanium oxynitride TiNxOy thin films,” Solid State Ionics 192, 693–698, 267–269 (2011).
  4. P. Carvalho, F. Vaz, L. Rebouta, L. Cunha, C. J. Tavares, C. Moura, E. Alves, A. Cavaleiro, Ph. Goudeau, E. Le Bourhis, J. P. Riviere, J. F. Pierson, and O. Banakh, “Structural, electrical, optical, and mechanical characterizations of decorative ZrOxNy thin films,” J. Appl. Phys.98(2), 023715 (2005). [CrossRef]
  5. J. M. Chappé, N. Martin, G. Terwagne, J. Lintymer, J. Gavoille, and J. Takadoum, “Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering,” Thin Solid Films440(1-2), 66–73 (2003). [CrossRef]
  6. F. Vaz, P. Cerqueira, L. Rebouta, S. M. C. Nascimento, E. Alves, Ph. Goudeau, J. P. Riviere, K. Pischow, and J. de Rijk, “Structural, optical and mechanical properties of coloured TiNxOy thin films,” Thin Solid Films447–448, 449–454 (2004). [CrossRef]
  7. M. Braic, M. Balaceanu, A. Vladescu, A. Kiss, V. Braic, G. Epurescu, G. Dinescu, A. Moldovan, R. Birjega, and M. Dinescu, “Preparation and characterization of titanium oxy-nitride thin films,” Appl. Surf. Sci.253(19), 8210–8214 (2007). [CrossRef]
  8. S. Y. Kim, D. H. Han, J. N. Kim, and J. J. Lee, “Titanium oxynitride films for a bipolar plate of polymer electrolyte membrane fuel cell prepared by inductively coupled plasma assisted reactive sputtering,” J. Power Sources193(2), 570–574 (2009). [CrossRef]
  9. M. E. A. Warwick, G. Hyett, I. Ridley, F. R. Laffir, C. Olivero, P. Chapon, and R. Binions, “Synthesis and energy modelling studies of titanium oxy-nitride films as energy efficient glazing,” Sol. Energy Mater. Sol. Cells118, 149–156 (2013). [CrossRef]
  10. G. V. Naik, J. Kim, and A. Boltasseva, “Oxides and nitrides as alternative plasmonic materials in the optical range,” Opt. Mater. Express1(6), 1090–1099 (2011). [CrossRef]
  11. G. V. Naik, J. L. Schroeder, X. Ni, A. V. Kildishev, T. D. Sands, and A. Boltasseva, “Titanium nitride as a plasmonic material for visible and near-infrared wavelengths,” Opt. Mater. Express2(4), 478–489 (2012). [CrossRef]
  12. N. D. Cuong, D. J. Kim, B. D. Kang, and S. G. Yoon, “Structural and electrical properties of TiNxOy thin-film resistors for 30 dB applications of π -type attenuator,” J. Electrochem. Soc.153(9), G856–G859 (2006). [CrossRef]
  13. G. He, L. D. Zhang, G. H. Li, M. Liu, and X. J. Wang, “Structure, composition and evolution of dispersive optical constants of sputtered TiO2 thin films: effects of nitrogen doping,” J. Phys. D Appl. Phys.41(4), 045304 (2008). [CrossRef]
  14. R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, and Y. Taga, “Visible-light photocatalysis in nitrogen-doped titanium oxides,” Science293(5528), 269–271 (2001). [CrossRef] [PubMed]
  15. E. Martinez-Ferrero, Y. Sakatani, C. Boissiere, D. Grosso, A. Fuertes, J. Fraxedas, and C. Sanchez, “Nanostructured titanium oxynitride porous thin films as efficient visible-active photocatalysts,” Adv. Funct. Mater.17(16), 3348–3354 (2007). [CrossRef]
  16. C. K. Lim, H. Huang, C. L. Chow, P. Y. Tan, X. Chen, M. S. Tse, and O. K. Tan, “Enhanced charge transport properties of dye-sensitized solar cells using TiNxOy nanostructure composite photoanode,” J. Phys. Chem. C116(37), 19659–19664 (2012). [CrossRef]
  17. M. Lazarov, P. Raths, H. Metzger, and W. Spirkl, “Optical constants and film density of TiNxOy solar selective absorbers,” J. Appl. Phys.77(5), 2133 (1995). [CrossRef]
  18. A. Rizzo, M. A. Signore, L. Tapfer, E. Piscopiello, A. Cappello, E. Bemporad, and M. Sebastiani, “Graded selective coatings based on zirconium and titanium oxynitride,” J. Phys. D Appl. Phys.42(11), 115406 (2009). [CrossRef]
  19. J. Park, J. Y. Lee, and J. H. Cho, “Ultraviolet-visible absorption spectra of N-doped TiO2 film deposited on sapphire,” J. Appl. Phys.100(11), 113534 (2006). [CrossRef]
  20. T. L. Chen, Y. Hirose, T. Hitosugi, and T. Hasegawa, “One unit-cell seed layer induced epitaxial growth of heavily nitrogen doped anatase TiO2 films,” J. Phys. D Appl. Phys.41(6), 062005 (2008). [CrossRef]
  21. E. P. Quijorna, V. T. Costa, F. A. Rueda, P. H. Fernandez, A. Climent, F. Rossi, and M. M. Silvan, “TiNxOy/TiN dielectric contrasts obtained by ion implantation of O+2; structural, optical and electrical properties,” J. Phys. D Appl. Phys.44, 235501 (2011).
  22. V. Stranak, M. Quaas, R. Bogdanowicz, H. Steffen, H. Wulff, Z. Hubicka, M. Tichy, and R. Hippler, “Effect of nitrogen doping on TiNxOy thin film formation at reactive high-power pulsed magnetron sputtering,” J. Phys. D Appl. Phys.43(28), 285203 (2010). [CrossRef]
  23. C. Rousselot and N. Martin, “Influence of two reactive gases on the instabilities of the reactive sputtering process,” Surf. Coat. Tech.142–144, 206–210 (2001). [CrossRef]
  24. S. K. O’Leary, S. R. Johnson, and P. K. Lim, “The relationship between the distribution of electronic states and the optical absorption spectrum of an amorphous semiconductor: An empirical analysis,” J. Appl. Phys.82(7), 3334 (1997). [CrossRef]
  25. L. Rebouta, P. Capela, M. Andritschky, A. Matilainen, P. Santilli, K. Pischow, and E. Alves, “Characterization of TiAlSiN/TiAlSiON/SiO2 optical stack designed by modelling calculations for solar selective applications,” Sol. Energy Mater. Sol. Cells105, 202–207 (2012). [CrossRef]
  26. G. B. Smith, P. D. Swift, and A. Bendavid, “TiNx films with metallic behavior at high N/Ti ratios for better solar control windows,” Appl. Phys. Lett.75(5), 630 (1999). [CrossRef]
  27. J. Graciani, S. Hamad, and J. F. Sanz, “Changing the physical and chemical properties of titanium oxynitrides TiN1−xOx by changing the composition,” Phys. Rev. B80(18), 184112 (2009). [CrossRef]
  28. N. Selvakumara and H. C. Barshilia, “Review of physical vapor deposited (PVD) spectrally selective coatings for mid- and high-temperature solar thermal applications,” Sol. Energy Mater. Sol. Cells98, 1–23 (2012). [CrossRef]
  29. H. C. Barshilia, N. Selvakumar, K. S. Rajam, D. V. Sridhara Rao, K. Muraleedharan, and A. Biswas, “TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications,” Appl. Phys. Lett.89(19), 191909 (2006). [CrossRef]
  30. Q. C. Zhang and D. R. Mills, “New cermet film structures with much improved selectivity for solar thermal applications,” Appl. Phys. Lett.60(5), 545 (1992). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited