1 March 2014, Volume 4, Issue 3, pp. 411-574
16 articles
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Direct plasma etching is a powerful method for producing antireflective nanostructures on optical polymers, such as cycloolefin polymers. SEM micrograph of the double-structured Zeonex at a viewing angle of 45 degrees. For details, see U. Schulz et al. Opt. Mater. Express 4,568-574 (2013).
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