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RAPID Lithography: New Photoresists Achieve Nanoscale Resolution

John T. Fourkas

Optics and Photonics News, Vol. 22, Issue 6, pp. 24-29 (2011)
http://dx.doi.org/10.1364/OPN.22.6.000024


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Abstract

Over the past decade, researchers have shattered the traditional view of the diffraction limit. Using new techniques, they have obtained resolution far smaller than the wavelength of light excitation or emission. Similar concepts are now being applied to photolithography, making it possible to create nanoscale features in a photoresist using visible or near-infrared light.

© 2011 Optical Society of America

OCIS Codes
(190.4180) Nonlinear optics : Multiphoton processes
(260.5130) Physical optics : Photochemistry
(110.4235) Imaging systems : Nanolithography

Citation
John T. Fourkas, "RAPID Lithography: New Photoresists Achieve Nanoscale Resolution," Optics & Photonics News 22(6), 24-29 (2011)
http://www.opticsinfobase.org/opn/abstract.cfm?URI=opn-22-6-24


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