Spotlight Summary by Paul Mirkarimi

• Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers

• As the authors note, the optical performance of Mo/Si multilayer films is a topic of significant interest to emerging technologies, such as extreme ultraviolet (EUV) lithography, where large amounts of EUV light are...
• Appl. Opt. 50(9) C148-C153 (2011) View: Abstract | HTML | PDF