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  • August 2009

Optics InfoBase > Spotlight on Optics > Optimized circularly symmetric phase mask to extend the depth of focus


Optimized circularly symmetric phase mask to extend the depth of focus

Published in JOSA A, Vol. 26 Issue 8, pp.1889-1895 (2009)
by Feng Zhou, Ran Ye, Guangwei Li, Haitao Zhang, and Dongsheng Wang

Source article Abstract | Full Text: XHTML | Full Text: PDF


Spotlight summary: Conventional imaging systems typically have a fixed trade-off between depth of focus and resolution. In recent years pupil engineering has allowed the design of systems to improve the depth of focus. In this interesting and well-organized paper the authors use a novel approach, based on rational functions to design circularly symmetric phase masks that extend the depth of focus of imaging systems.

Technical Division: Information Acquisition, Processing, and Display
ToC Category: Fourier Optics and Signal Processing
OCIS Codes: (070.0070) Fourier optics and signal processing : Fourier optics and signal processing
(100.5090) Image processing : Phase-only filters
(110.0110) Imaging systems : Imaging systems


Posted on August 12, 2009

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