|
Optimized circularly symmetric phase mask to extend the depth of focusPublished in JOSA A, Vol. 26 Issue 8, pp.1889-1895 (2009) |
Spotlight summary: Conventional imaging systems typically have a fixed trade-off between depth of focus and resolution. In recent years pupil engineering has allowed the design of systems to improve the depth of focus. In this interesting and well-organized paper the authors use a novel approach, based on rational functions to design circularly symmetric phase masks that extend the depth of focus of imaging systems.
Technical Division: Information Acquisition, Processing, and Display
ToC Category: Fourier Optics and Signal Processing
| OCIS Codes: | (070.0070) Fourier optics and signal processing : Fourier optics and signal processing |
| (100.5090) Image processing : Phase-only filters | |
| (110.0110) Imaging systems : Imaging systems |
Posted on August 12, 2009
Add Comment
You must log in to add comments.
Related Journal Articles 
- Can the Wigner transform of a two-dimensional rotationally symmetric beam be fully recovered from the Wigner transform of its one-dimensional approximation? (OL)
- Imaging interferometric lithography: approaching the resolution limits of optics (OL)
- Superresolving Optical System with Time Multiplexing and Computer Decoding (AO)
- Spectral interferometric optical coherence tomography with nonlinear β-barium borate time gating (OL)
- Entangled-photon Fourier optics (JOSAB)
Related Conference Papers
- Form Factor Enhancement of Imaging Systems Using a Cubic Phase Mask
- Imaging Properties of Three-Dimensional Pupils
- Teaching Wigner optics: what and how
- Why teach Wigner Optics?
- Imaging Sensors that asks 20 questions: Fulfilling Dr. Healy’s Vision
- Imaging Sensors that asks 20 questions: Fulfilling Dr. Healy’s Vision