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Spotlight on Optics


  • February 2010

Optics InfoBase > Spotlight on Optics > Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source

Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source

Published in Optics Express, Vol. 18 Issue 5, pp.4346-4355 (2010)
by Frank Barkusky, Armin Bayer, Stefan Döring, Peter Grossmann, and Klaus Mann

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Spotlight summary: In this article, the authors present a novel study of EUV-induced damage thresholds for grazing incidence mirrors based on gold films, as well as for Mo/Si multilayer mirrors, through the use of a nanosecond table-top EUV source. For gold films, a linear behavior between threshold fluence and film thickness was observed, indicating a thermally dominated process. For Mo/Si multilayer mirrors, on the other hand, two damage regimes were observed, corresponding to spotlike and crater damage. Fused silica exhibits very smooth ablation craters, indicating a direct photon induced, bond-breaking process. Silicon shows the highest damage threshold of all investigated substrate and coating materials. The experiments reported in this work demonstrate that single-pulse EUV damage thresholds of substrate materials are higher than those of thin reflective coatings (a fact that is well known for higher UV and visible wavelengths). Thus, metal or multilayer films immediately exposed to EUV radiation will clearly be the limiting factor for high fluence applications of 13.5 nm radiation.

Technical Division: Optoelectronics
ToC Category: Lasers and Laser Optics
OCIS Codes: (140.3330) Lasers and laser optics : Laser damage
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

Posted on February 24, 2010

Reader Comments

03/17/2010 5:46 AM posted by Frank B.

It is a great pleasure for me to see our work highlighted in Spotlight on Optics.

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